Plasma enhanced chemical vapor deposition of vanadium carbide VC1−x and VOx from vanadocene Cp2V

Plasma enhanced CVD of vanadium carbides and oxides is reported for the first time. Vanadium carbide and vanadium oxides are of technological interest for hard coatings (VC1–x), storage media (VO2), and smart electrochromic windows (V2O5), and until now have been prepared mainly by physical depositi...

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Bibliographic Details
Published in:Advanced materials (Weinheim) 1994-05, Vol.6 (5), p.392-395
Main Authors: Deutschmann, Lutz, Messelhäuser, Johannes, Suhr, Harald, Herrmann, Wolfgang A., Härter, Peter
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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Summary:Plasma enhanced CVD of vanadium carbides and oxides is reported for the first time. Vanadium carbide and vanadium oxides are of technological interest for hard coatings (VC1–x), storage media (VO2), and smart electrochromic windows (V2O5), and until now have been prepared mainly by physical deposition methods. The advantages of the precursor vanadocene are outlined and the influence of experimental parameters such as the hydrogen flow rate and the substrate temperature on the composition and resistivity of the films described.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.19940060512