Chlorine-based smooth reactive ion beam etching of indium-containing III-V compound semiconductor: MicroProcess

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Bibliographic Details
Published in:Japanese journal of applied physics 1992, Vol.31 (12B), p.4381-4386
Main Authors: YOSHIKAWA, T, KOHMOTO, S, ANAN, M, HAMAO, N, BABA, M, TAKADO, N, SUGIMOTO, Y, SUGIMOTO, M, ASAKAWA, K
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Mechanical and acoustical properties
adhesion
Physics
Solid surfaces and solid-solid interfaces
Solid-fluid interfaces
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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ISSN:0021-4922
1347-4065