Detection and printability of shifter defects in phase-shifting masks. II: Defocus characteristics: MicroProcess

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Bibliographic Details
Published in:Japanese journal of applied physics 1992, Vol.31 (12B), p.4155-4160
Main Authors: WATANABE, H, SUGIURA, E, IMORIYA, T, TODOKORO, Y, INOUE, M
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:Get full text
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ISSN:0021-4922
1347-4065