Study on the mechanism of negative ion formation in cesium sputter‐type negative ion sources

The mechanism of forming negative ions in cesium sputter negative ion sources is studied by means of a modified dipole layer model and quantum theory. Formulas of the change of work function on the metal surface adsorbing cesium layer and the electron transfer probability are given. The formation pr...

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Bibliographic Details
Published in:Review of Scientific Instruments 1992-04, Vol.63 (4), p.2643-2645
Main Authors: Rao, Yusheng, Chen, Houpeng, Xi, Boling, Dong, Beidou, Xia, Baihua
Format: Article
Language:English
Subjects:
Atomic, molecular and charged-particle sources and detectors
Charged-particle beam sources and detectors
Exact sciences and technology
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Physics
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Summary:The mechanism of forming negative ions in cesium sputter negative ion sources is studied by means of a modified dipole layer model and quantum theory. Formulas of the change of work function on the metal surface adsorbing cesium layer and the electron transfer probability are given. The formation probabilities of the negative ions are derived using a quantum tunneling model. The negative ion yield is also calculated. The calculated results are in essential agreement with the experimental data. The philosophy described in this paper may offer a useful theoretical model for the mechanism study of cesium sputter negative ion sources.
ISSN:0034-6748
1089-7623
DOI:10.1063/1.1142866