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Fine patterns of positive-working resists using a polymide langmuir-blodgett film system

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Bibliographic Details
Published in:Japanese journal of applied physics 1991, Vol.30 (2A), p.L218-L221
Main Authors: IWAMOTO, M, KASAHARA, S, IRIYAMA, K, NISHIKATA, Y, KAKIMOTO, M, IMAI, Y
Format: Article
Language:English
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ISSN:0021-4922
1347-4065