Conformal deposition of WSix films on micron-sized trenches : the reactivity of film precursors

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Bibliographic Details
Published in:Applied physics letters 1992-08, Vol.61 (7), p.764-765
Main Authors: SAITO, T, SHIMOGAKI, Y, EGASHIRA, Y, KOMIYAMA, H, YUYAMA, Y, SUGAWARA, K
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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ISSN:0003-6951
1077-3118
DOI:10.1063/1.107791