Stable, self-aligned TiNxOy/TiSi2 contact formation for submicron device applications

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Bibliographic Details
Published in:Applied physics letters 1987-06, Vol.50 (22), p.1598-1600
Main Authors: KU, Y. H, LOUIS, E, SHIH, D. K, LEE, S. K, KWONG, D. L, ALVI, N. S
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Interfaces
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:Get full text
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ISSN:0003-6951
1077-3118
DOI:10.1063/1.97792