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The effect of oxygen on the etch rate of NF3 discharges

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Bibliographic Details
Published in:	Journal of the Electrochemical Society 1986-10, Vol.133 (10), p.2168-2171
Main Authors:	NORDHEDEN, K. J, VERDEYEN, J. T
Format:	Article
Language:	English
Subjects:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Solid-fluid interfaces Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
Online Access:	Get full text
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