Deposition of Al2O3 and SiO2 films via pyrolysis of aluminum acetylacetonate and hexamethyldisiloxane in the presence of nitrogen compounds

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Bibliographic Details
Published in:Inorganic materials 2000-12, Vol.36 (12), p.1243-1250
Main Authors: MITTOV, O. N, PONOMAREVA, N. I, MITTOVA, I. Ya, NOVIKOVA, E. D, GADEBSKAYA, T. A, BEZRYADIN, M. N
Format: Article
Language:eng ; rus
Online Access:Get full text
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ISSN:0020-1685
1608-3172
DOI:10.1023/A:1026685715881