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Formation of TbFe amorphous thin films by high dose implantation of Tb ions and their magnetic properties
The decrease was observed in the magnetic moment in unit area of the Fe films implanted with high dose Tb ions. This decrease was shown to be due to the formation of the Tb-Fe alloy layer sandwitched by Fe layers. This multilayer structure was similar to that reported previously in the Dy-Ni films i...
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Published in: | IEEE transactions on magnetics 1984-09, Vol.20 (5), p.1314-1316 |
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container_title | IEEE transactions on magnetics |
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creator | Gondo, Y. Suezawa, Y. Tsuchiya, R. |
description | The decrease was observed in the magnetic moment in unit area of the Fe films implanted with high dose Tb ions. This decrease was shown to be due to the formation of the Tb-Fe alloy layer sandwitched by Fe layers. This multilayer structure was similar to that reported previously in the Dy-Ni films implanted with high dose Dy ions. The formation of an amorphous Tb-Fe layer was revealed by electron diffraction observations when Tb dose was high. It was found that an in-plane uniaxial magnetic anisotropy was induced when a magnetic field was applied in the plane of Fe films during Tb ion implantation at room temperature. |
doi_str_mv | 10.1109/TMAG.1984.1063436 |
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This decrease was shown to be due to the formation of the Tb-Fe alloy layer sandwitched by Fe layers. This multilayer structure was similar to that reported previously in the Dy-Ni films implanted with high dose Dy ions. The formation of an amorphous Tb-Fe layer was revealed by electron diffraction observations when Tb dose was high. 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This decrease was shown to be due to the formation of the Tb-Fe alloy layer sandwitched by Fe layers. This multilayer structure was similar to that reported previously in the Dy-Ni films implanted with high dose Dy ions. The formation of an amorphous Tb-Fe layer was revealed by electron diffraction observations when Tb dose was high. It was found that an in-plane uniaxial magnetic anisotropy was induced when a magnetic field was applied in the plane of Fe films during Tb ion implantation at room temperature.</description><subject>Amorphous materials</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Diffraction</subject><subject>Electrons</subject><subject>Exact sciences and technology</subject><subject>Iron alloys</subject><subject>Magnetic anisotropy</subject><subject>Magnetic fields</subject><subject>Magnetic films</subject><subject>Magnetic moments</subject><subject>Magnetic multilayers</subject><subject>Magnetic properties</subject><subject>Magnetic properties and materials</subject><subject>Magnetic properties of surface, thin films and multilayers</subject><subject>Materials science</subject><subject>Metals, semimetals and alloys</subject><subject>Physics</subject><subject>Specific materials</subject><issn>0018-9464</issn><issn>1941-0069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1984</creationdate><recordtype>article</recordtype><recordid>eNpNkD9PwzAQxS0EEqXwARCLB8SW4oudxB6rihakIpYyW45jN0b5h50O_fY4aoW63J2l93vnewg9AlkAEPG6-1xuFiA4WwDJKaP5FZqBYJAQkotrNCMEeCJYzm7RXQg_8ckyIDPk1r1v1ej6DvcW78q1wart_VD3h4DH2nXYuqYNuDzi2u1rXPXBYNcOjerGCwzHKWDVVZExzuNW7TszOo0H3w_Gj86Ee3RjVRPMw7nP0ff6bbd6T7Zfm4_VcptoKuiYcCGKqqCW2qpIdaFLQ_IMaGF1qYqKC0q4SkvDcstBE1WBBs2yDIq00pSUls7Ry8k3rv49mDDK1gVtmvhjE4-SKacERKxzBCeh9n0I3lg5eNcqf5RA5BSqnEKVU6jyHGpkns_mKmjVWK867cI_yAXnjE2yp5PMGWMubE8mf1ITgRk</recordid><startdate>198409</startdate><enddate>198409</enddate><creator>Gondo, Y.</creator><creator>Suezawa, Y.</creator><creator>Tsuchiya, R.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>198409</creationdate><title>Formation of TbFe amorphous thin films by high dose implantation of Tb ions and their magnetic properties</title><author>Gondo, Y. ; Suezawa, Y. ; Tsuchiya, R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c393t-8997d73f3fd72c7cbe065137fcba7d89308a2be46f81c0ad1c1c455172dc30bf3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1984</creationdate><topic>Amorphous materials</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Diffraction</topic><topic>Electrons</topic><topic>Exact sciences and technology</topic><topic>Iron alloys</topic><topic>Magnetic anisotropy</topic><topic>Magnetic fields</topic><topic>Magnetic films</topic><topic>Magnetic moments</topic><topic>Magnetic multilayers</topic><topic>Magnetic properties</topic><topic>Magnetic properties and materials</topic><topic>Magnetic properties of surface, thin films and multilayers</topic><topic>Materials science</topic><topic>Metals, semimetals and alloys</topic><topic>Physics</topic><topic>Specific materials</topic><toplevel>online_resources</toplevel><creatorcontrib>Gondo, Y.</creatorcontrib><creatorcontrib>Suezawa, Y.</creatorcontrib><creatorcontrib>Tsuchiya, R.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on magnetics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Gondo, Y.</au><au>Suezawa, Y.</au><au>Tsuchiya, R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Formation of TbFe amorphous thin films by high dose implantation of Tb ions and their magnetic properties</atitle><jtitle>IEEE transactions on magnetics</jtitle><stitle>TMAG</stitle><date>1984-09</date><risdate>1984</risdate><volume>20</volume><issue>5</issue><spage>1314</spage><epage>1316</epage><pages>1314-1316</pages><issn>0018-9464</issn><eissn>1941-0069</eissn><coden>IEMGAQ</coden><abstract>The decrease was observed in the magnetic moment in unit area of the Fe films implanted with high dose Tb ions. This decrease was shown to be due to the formation of the Tb-Fe alloy layer sandwitched by Fe layers. This multilayer structure was similar to that reported previously in the Dy-Ni films implanted with high dose Dy ions. The formation of an amorphous Tb-Fe layer was revealed by electron diffraction observations when Tb dose was high. It was found that an in-plane uniaxial magnetic anisotropy was induced when a magnetic field was applied in the plane of Fe films during Tb ion implantation at room temperature.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/TMAG.1984.1063436</doi><tpages>3</tpages></addata></record> |
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subjects | Amorphous materials Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Diffraction Electrons Exact sciences and technology Iron alloys Magnetic anisotropy Magnetic fields Magnetic films Magnetic moments Magnetic multilayers Magnetic properties Magnetic properties and materials Magnetic properties of surface, thin films and multilayers Materials science Metals, semimetals and alloys Physics Specific materials |
title | Formation of TbFe amorphous thin films by high dose implantation of Tb ions and their magnetic properties |
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