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Ultralow-Dark-Current CdHgTe FPAs in the SWIR Range at CEA and Sofradir
We report the first results of work carried out at CEA and Sofradir to build ultralow-dark-current focal-plane arrays (FPAs) in the short-wave infrared range (SWIR) for space applications. These FPAs are designed to detect very low flux in the 2- μ m wavelength range. To this end, Sofradir has desig...
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Published in: | Journal of electronic materials 2012-10, Vol.41 (10), p.2686-2693 |
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container_end_page | 2693 |
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container_title | Journal of electronic materials |
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creator | Gravrand, O. Mollard, L. Boulade, O. Moreau, V. Sanson, E. Destefanis, G. |
description | We report the first results of work carried out at CEA and Sofradir to build ultralow-dark-current focal-plane arrays (FPAs) in the short-wave infrared range (SWIR) for space applications. These FPAs are designed to detect very low flux in the 2-
μ
m wavelength range. To this end, Sofradir has designed a source follower per detector read-out circuit (ROIC, 384 × 288, 15
μ
m pitch). This ROIC has been hybridized on different HgCdTe diode configurations processed at CEA-LETI, and low-flux characterizations have been carried out at CEA-IRFU at low temperature (from 60 K to 160 K). Both ion-implanted
p
/
n
and
n
/
p
diodes have been evaluated. The metallurgical nature of the absorbing layer has also been examined, and both molecular-beam epitaxy (MBE) and liquid-phase epitaxy (LPE) have been applied. Dark-current measurements are discussed in comparison with previous results from the literature. State-of-the-art dark currents are recorded for temperatures higher than 120 K. At temperatures lower than 100 K, the decrease in dark current flattens out for both technologies. In this region, currents between 0.4 e
–
/s/pixel and 0.06 e
–
/s/pixel are reported. |
doi_str_mv | 10.1007/s11664-012-2181-8 |
format | article |
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μ
m wavelength range. To this end, Sofradir has designed a source follower per detector read-out circuit (ROIC, 384 × 288, 15
μ
m pitch). This ROIC has been hybridized on different HgCdTe diode configurations processed at CEA-LETI, and low-flux characterizations have been carried out at CEA-IRFU at low temperature (from 60 K to 160 K). Both ion-implanted
p
/
n
and
n
/
p
diodes have been evaluated. The metallurgical nature of the absorbing layer has also been examined, and both molecular-beam epitaxy (MBE) and liquid-phase epitaxy (LPE) have been applied. Dark-current measurements are discussed in comparison with previous results from the literature. State-of-the-art dark currents are recorded for temperatures higher than 120 K. At temperatures lower than 100 K, the decrease in dark current flattens out for both technologies. In this region, currents between 0.4 e
–
/s/pixel and 0.06 e
–
/s/pixel are reported.</description><identifier>ISSN: 0361-5235</identifier><identifier>EISSN: 1543-186X</identifier><identifier>DOI: 10.1007/s11664-012-2181-8</identifier><identifier>CODEN: JECMA5</identifier><language>eng</language><publisher>Boston: Springer US</publisher><subject>Applied sciences ; Cadmium telluride ; Characterization and Evaluation of Materials ; Chemistry and Materials Science ; Cross-disciplinary physics: materials science; rheology ; Diodes ; Electronics ; Electronics and Microelectronics ; Exact sciences and technology ; Instrumentation ; Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids) ; Materials ; Materials Science ; Metallurgy ; Methods of deposition of films and coatings; film growth and epitaxy ; Molecular beam epitaxy ; Molecular, atomic, ion, and chemical beam epitaxy ; Optical and Electronic Materials ; Optoelectronic devices ; Physics ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Solid State Physics</subject><ispartof>Journal of electronic materials, 2012-10, Vol.41 (10), p.2686-2693</ispartof><rights>TMS 2012</rights><rights>2014 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c346t-ed2938f877e7118c0cf493cd504ccb4b31c950d863b33ed2a232a75593a57cfd3</citedby><cites>FETCH-LOGICAL-c346t-ed2938f877e7118c0cf493cd504ccb4b31c950d863b33ed2a232a75593a57cfd3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,314,780,784,789,790,23930,23931,25140,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=26624688$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Gravrand, O.</creatorcontrib><creatorcontrib>Mollard, L.</creatorcontrib><creatorcontrib>Boulade, O.</creatorcontrib><creatorcontrib>Moreau, V.</creatorcontrib><creatorcontrib>Sanson, E.</creatorcontrib><creatorcontrib>Destefanis, G.</creatorcontrib><title>Ultralow-Dark-Current CdHgTe FPAs in the SWIR Range at CEA and Sofradir</title><title>Journal of electronic materials</title><addtitle>Journal of Elec Materi</addtitle><description>We report the first results of work carried out at CEA and Sofradir to build ultralow-dark-current focal-plane arrays (FPAs) in the short-wave infrared range (SWIR) for space applications. These FPAs are designed to detect very low flux in the 2-
μ
m wavelength range. To this end, Sofradir has designed a source follower per detector read-out circuit (ROIC, 384 × 288, 15
μ
m pitch). This ROIC has been hybridized on different HgCdTe diode configurations processed at CEA-LETI, and low-flux characterizations have been carried out at CEA-IRFU at low temperature (from 60 K to 160 K). Both ion-implanted
p
/
n
and
n
/
p
diodes have been evaluated. The metallurgical nature of the absorbing layer has also been examined, and both molecular-beam epitaxy (MBE) and liquid-phase epitaxy (LPE) have been applied. Dark-current measurements are discussed in comparison with previous results from the literature. State-of-the-art dark currents are recorded for temperatures higher than 120 K. At temperatures lower than 100 K, the decrease in dark current flattens out for both technologies. In this region, currents between 0.4 e
–
/s/pixel and 0.06 e
–
/s/pixel are reported.</description><subject>Applied sciences</subject><subject>Cadmium telluride</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemistry and Materials Science</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Diodes</subject><subject>Electronics</subject><subject>Electronics and Microelectronics</subject><subject>Exact sciences and technology</subject><subject>Instrumentation</subject><subject>Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)</subject><subject>Materials</subject><subject>Materials Science</subject><subject>Metallurgy</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Molecular beam epitaxy</subject><subject>Molecular, atomic, ion, and chemical beam epitaxy</subject><subject>Optical and Electronic Materials</subject><subject>Optoelectronic devices</subject><subject>Physics</subject><subject>Semiconductor electronics. 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Solid state devices</subject><subject>Solid State Physics</subject><issn>0361-5235</issn><issn>1543-186X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNp1kE1LxDAQhoMouK7-AG8B8RjNJE2aHpfqfsCCsh_orWTTdO1a2zXpIv57U7qIF09zmGfemXkQugZ6B5TG9x5AyohQYISBAqJO0ABExAko-XqKBpRLIIJxcY4uvN9RCiJgAzRZV63TVfNFHrR7J-nBOVu3OM2n25XF4-eRx2WN2zeLly-zBV7oemuxDsDjCOs6x8umcDov3SU6K3Tl7dWxDtF6_LhKp2T-NJmlozkxPJItsTlLuCpUHNsYQBlqiijhJhc0MmYTbTiYRNBcSb7hPMCacaZjIRKuRWyKnA_RTZ-7d83nwfo22zUHV4eVGVCeUIgUVYGCnjKu8d7ZItu78kO77wBlna-s95UFX1nnK-tmbo_J2htdhbdqU_rfQSYli6TqONZzPrSCDff3gv_CfwBUPHck</recordid><startdate>20121001</startdate><enddate>20121001</enddate><creator>Gravrand, O.</creator><creator>Mollard, L.</creator><creator>Boulade, O.</creator><creator>Moreau, V.</creator><creator>Sanson, E.</creator><creator>Destefanis, G.</creator><general>Springer US</general><general>Springer</general><general>Springer Nature B.V</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>3V.</scope><scope>7XB</scope><scope>88I</scope><scope>8AF</scope><scope>8AO</scope><scope>8FE</scope><scope>8FG</scope><scope>8FK</scope><scope>8G5</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>ARAPS</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>GNUQQ</scope><scope>GUQSH</scope><scope>HCIFZ</scope><scope>KB.</scope><scope>L6V</scope><scope>M2O</scope><scope>M2P</scope><scope>M7S</scope><scope>MBDVC</scope><scope>P5Z</scope><scope>P62</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope><scope>Q9U</scope><scope>S0X</scope></search><sort><creationdate>20121001</creationdate><title>Ultralow-Dark-Current CdHgTe FPAs in the SWIR Range at CEA and Sofradir</title><author>Gravrand, O. ; Mollard, L. ; Boulade, O. ; Moreau, V. ; Sanson, E. ; Destefanis, G.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c346t-ed2938f877e7118c0cf493cd504ccb4b31c950d863b33ed2a232a75593a57cfd3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Applied sciences</topic><topic>Cadmium telluride</topic><topic>Characterization and Evaluation of Materials</topic><topic>Chemistry and Materials Science</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Diodes</topic><topic>Electronics</topic><topic>Electronics and Microelectronics</topic><topic>Exact sciences and technology</topic><topic>Instrumentation</topic><topic>Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)</topic><topic>Materials</topic><topic>Materials Science</topic><topic>Metallurgy</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Molecular beam epitaxy</topic><topic>Molecular, atomic, ion, and chemical beam epitaxy</topic><topic>Optical and Electronic Materials</topic><topic>Optoelectronic devices</topic><topic>Physics</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Solid State Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Gravrand, O.</creatorcontrib><creatorcontrib>Mollard, L.</creatorcontrib><creatorcontrib>Boulade, O.</creatorcontrib><creatorcontrib>Moreau, V.</creatorcontrib><creatorcontrib>Sanson, E.</creatorcontrib><creatorcontrib>Destefanis, G.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>ProQuest Central (Corporate)</collection><collection>ProQuest Central (purchase pre-March 2016)</collection><collection>Science Database (Alumni Edition)</collection><collection>STEM Database</collection><collection>ProQuest Pharma Collection</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>ProQuest Central (Alumni) (purchase pre-March 2016)</collection><collection>Research Library (Alumni Edition)</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni Edition)</collection><collection>ProQuest Central UK/Ireland</collection><collection>Advanced Technologies & Aerospace Collection</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>ProQuest Central Student</collection><collection>Research Library Prep</collection><collection>SciTech Premium Collection</collection><collection>Materials Science Database</collection><collection>ProQuest Engineering Collection</collection><collection>Research Library</collection><collection>Science Database</collection><collection>Engineering Database</collection><collection>Research Library (Corporate)</collection><collection>Advanced Technologies & Aerospace Database</collection><collection>ProQuest Advanced Technologies & Aerospace Collection</collection><collection>Materials Science Collection</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Engineering Collection</collection><collection>ProQuest Central Basic</collection><collection>SIRS Editorial</collection><jtitle>Journal of electronic materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Gravrand, O.</au><au>Mollard, L.</au><au>Boulade, O.</au><au>Moreau, V.</au><au>Sanson, E.</au><au>Destefanis, G.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Ultralow-Dark-Current CdHgTe FPAs in the SWIR Range at CEA and Sofradir</atitle><jtitle>Journal of electronic materials</jtitle><stitle>Journal of Elec Materi</stitle><date>2012-10-01</date><risdate>2012</risdate><volume>41</volume><issue>10</issue><spage>2686</spage><epage>2693</epage><pages>2686-2693</pages><issn>0361-5235</issn><eissn>1543-186X</eissn><coden>JECMA5</coden><abstract>We report the first results of work carried out at CEA and Sofradir to build ultralow-dark-current focal-plane arrays (FPAs) in the short-wave infrared range (SWIR) for space applications. These FPAs are designed to detect very low flux in the 2-
μ
m wavelength range. To this end, Sofradir has designed a source follower per detector read-out circuit (ROIC, 384 × 288, 15
μ
m pitch). This ROIC has been hybridized on different HgCdTe diode configurations processed at CEA-LETI, and low-flux characterizations have been carried out at CEA-IRFU at low temperature (from 60 K to 160 K). Both ion-implanted
p
/
n
and
n
/
p
diodes have been evaluated. The metallurgical nature of the absorbing layer has also been examined, and both molecular-beam epitaxy (MBE) and liquid-phase epitaxy (LPE) have been applied. Dark-current measurements are discussed in comparison with previous results from the literature. State-of-the-art dark currents are recorded for temperatures higher than 120 K. At temperatures lower than 100 K, the decrease in dark current flattens out for both technologies. In this region, currents between 0.4 e
–
/s/pixel and 0.06 e
–
/s/pixel are reported.</abstract><cop>Boston</cop><pub>Springer US</pub><doi>10.1007/s11664-012-2181-8</doi><tpages>8</tpages></addata></record> |
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source | Springer Nature:Jisc Collections:Springer Nature Read and Publish 2023-2025: Springer Reading List |
subjects | Applied sciences Cadmium telluride Characterization and Evaluation of Materials Chemistry and Materials Science Cross-disciplinary physics: materials science rheology Diodes Electronics Electronics and Microelectronics Exact sciences and technology Instrumentation Liquid phase epitaxy deposition from liquid phases (melts, solutions, and surface layers on liquids) Materials Materials Science Metallurgy Methods of deposition of films and coatings film growth and epitaxy Molecular beam epitaxy Molecular, atomic, ion, and chemical beam epitaxy Optical and Electronic Materials Optoelectronic devices Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Solid State Physics |
title | Ultralow-Dark-Current CdHgTe FPAs in the SWIR Range at CEA and Sofradir |
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