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Benchtop Polymer MEMS
Loctite photopatternable adhesives 3108, 3340, and 3525 are introduced for microelectromechanical systems (MEMS) applications. These materials are patterned within minutes by exposure to ultraviolet (UV) light followed by rinsing with a solvent; no further processing is required. Because the uncured...
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Published in: | Journal of microelectromechanical systems 2006-10, Vol.15 (5), p.1108-1120 |
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description | Loctite photopatternable adhesives 3108, 3340, and 3525 are introduced for microelectromechanical systems (MEMS) applications. These materials are patterned within minutes by exposure to ultraviolet (UV) light followed by rinsing with a solvent; no further processing is required. Because the uncured fluid is relatively insensitive to room light, this can be done on any lab bench without the requirement for a clean room. The materials can be spin-coated to obtain films, or cast between spacers for layers up to 1 cm thick, and the cured polymers range from elastomeric to rigid. These adhesives are of interest for rapid, inexpensive fabrication of relatively low-resolution features (tens to hundreds of micrometers) by photocuring. They can alternatively be molded, like polydimethylsiloxane (PDMS), to achieve high resolution, as well as irreversibly bonded after an O 2 plasma treatment. In addition, like SU8, they can be used as molds for patterning PDMS. Initial characterization of resolution, swelling, and biocompatibility were performed. One of the polymers, 3340, can be used for packaging bioMEMS-on-complementary-metal-oxide-semiconductor (CMOS) chips, exploiting its biocompatibility and its photopatternability at thicknesses of 1500 mum to cover the bond wires while exposing the chip surface. As further demonstrations of the versatility of these materials, multilevel, interconnected channel structures were fabricated with a gelatin sacrificial layer, and magnetic films were prepared, since the polymers remain patternable even with additives |
doi_str_mv | 10.1109/JMEMS.2006.882610 |
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These materials are patterned within minutes by exposure to ultraviolet (UV) light followed by rinsing with a solvent; no further processing is required. Because the uncured fluid is relatively insensitive to room light, this can be done on any lab bench without the requirement for a clean room. The materials can be spin-coated to obtain films, or cast between spacers for layers up to 1 cm thick, and the cured polymers range from elastomeric to rigid. These adhesives are of interest for rapid, inexpensive fabrication of relatively low-resolution features (tens to hundreds of micrometers) by photocuring. They can alternatively be molded, like polydimethylsiloxane (PDMS), to achieve high resolution, as well as irreversibly bonded after an O 2 plasma treatment. In addition, like SU8, they can be used as molds for patterning PDMS. Initial characterization of resolution, swelling, and biocompatibility were performed. One of the polymers, 3340, can be used for packaging bioMEMS-on-complementary-metal-oxide-semiconductor (CMOS) chips, exploiting its biocompatibility and its photopatternability at thicknesses of 1500 mum to cover the bond wires while exposing the chip surface. 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(IEEE) 2006</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c355t-b8ff7870084f887d519f9e499c19c2814cd72b0f1e42d5235309a7078a44b0dc3</citedby><cites>FETCH-LOGICAL-c355t-b8ff7870084f887d519f9e499c19c2814cd72b0f1e42d5235309a7078a44b0dc3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1707770$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,54796</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=18197914$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Delille, R.</creatorcontrib><creatorcontrib>Urdaneta, M.G.</creatorcontrib><creatorcontrib>Moseley, S.J.</creatorcontrib><creatorcontrib>Smela, E.</creatorcontrib><title>Benchtop Polymer MEMS</title><title>Journal of microelectromechanical systems</title><addtitle>JMEMS</addtitle><description>Loctite photopatternable adhesives 3108, 3340, and 3525 are introduced for microelectromechanical systems (MEMS) applications. These materials are patterned within minutes by exposure to ultraviolet (UV) light followed by rinsing with a solvent; no further processing is required. Because the uncured fluid is relatively insensitive to room light, this can be done on any lab bench without the requirement for a clean room. The materials can be spin-coated to obtain films, or cast between spacers for layers up to 1 cm thick, and the cured polymers range from elastomeric to rigid. These adhesives are of interest for rapid, inexpensive fabrication of relatively low-resolution features (tens to hundreds of micrometers) by photocuring. They can alternatively be molded, like polydimethylsiloxane (PDMS), to achieve high resolution, as well as irreversibly bonded after an O 2 plasma treatment. In addition, like SU8, they can be used as molds for patterning PDMS. Initial characterization of resolution, swelling, and biocompatibility were performed. One of the polymers, 3340, can be used for packaging bioMEMS-on-complementary-metal-oxide-semiconductor (CMOS) chips, exploiting its biocompatibility and its photopatternability at thicknesses of 1500 mum to cover the bond wires while exposing the chip surface. As further demonstrations of the versatility of these materials, multilevel, interconnected channel structures were fabricated with a gelatin sacrificial layer, and magnetic films were prepared, since the polymers remain patternable even with additives</description><subject>Adhesives</subject><subject>Biocompatibility</subject><subject>Bonding</subject><subject>Channels</subject><subject>Chips</subject><subject>elastomer</subject><subject>Exact sciences and technology</subject><subject>Fabrication</subject><subject>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</subject><subject>Magnetic materials</subject><subject>Mechanical instruments, equipment and techniques</subject><subject>Microelectromechanical systems</subject><subject>Micromechanical devices</subject><subject>Micromechanical devices and systems</subject><subject>Micrometers</subject><subject>negative resist</subject><subject>Packaging</subject><subject>photopatternable</subject><subject>Physics</subject><subject>Plasma applications</subject><subject>Polymer</subject><subject>Polymer films</subject><subject>Polymers</subject><subject>R&D</subject><subject>rapid prototyping</subject><subject>Research & development</subject><subject>Silicone resins</subject><subject>Solvents</subject><subject>Wires</subject><issn>1057-7157</issn><issn>1941-0158</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNpdkM1LAzEQxYMoWKtHD-KlIOJp60w-NslRS_2iRUE9hzSb4Jbtbk3aQ_97d92C4GkG5vcebx4hFwhjRNC3L_Pp_H1MAfKxUjRHOCAD1BwzQKEO2x2EzCQKeUxOUloCIOcqH5Dze1-7r02zHr011W7l46gzOiVHwVbJn-3nkHw-TD8mT9ns9fF5cjfLHBNiky1UCFJJAMWDUrIQqIP2XGuH2lGF3BWSLiCg57QQlAkG2kqQynK-gMKxIbnpfdex-d76tDGrMjlfVbb2zTYZDVLnjEreklf_yGWzjXUbziBSLZhkDFsKe8rFJqXog1nHcmXjziCYrifz25PpejJ9T63meu9sk7NViLZ2ZfoTKtRSY5fgsudK7_3fuX1HSmA_NGxsrA</recordid><startdate>20061001</startdate><enddate>20061001</enddate><creator>Delille, R.</creator><creator>Urdaneta, M.G.</creator><creator>Moseley, S.J.</creator><creator>Smela, E.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7TB</scope><scope>7U5</scope><scope>8FD</scope><scope>FR3</scope><scope>L7M</scope><scope>F28</scope></search><sort><creationdate>20061001</creationdate><title>Benchtop Polymer MEMS</title><author>Delille, R. ; Urdaneta, M.G. ; Moseley, S.J. ; Smela, E.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c355t-b8ff7870084f887d519f9e499c19c2814cd72b0f1e42d5235309a7078a44b0dc3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>Adhesives</topic><topic>Biocompatibility</topic><topic>Bonding</topic><topic>Channels</topic><topic>Chips</topic><topic>elastomer</topic><topic>Exact sciences and technology</topic><topic>Fabrication</topic><topic>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</topic><topic>Magnetic materials</topic><topic>Mechanical instruments, equipment and techniques</topic><topic>Microelectromechanical systems</topic><topic>Micromechanical devices</topic><topic>Micromechanical devices and systems</topic><topic>Micrometers</topic><topic>negative resist</topic><topic>Packaging</topic><topic>photopatternable</topic><topic>Physics</topic><topic>Plasma applications</topic><topic>Polymer</topic><topic>Polymer films</topic><topic>Polymers</topic><topic>R&D</topic><topic>rapid prototyping</topic><topic>Research & development</topic><topic>Silicone resins</topic><topic>Solvents</topic><topic>Wires</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Delille, R.</creatorcontrib><creatorcontrib>Urdaneta, M.G.</creatorcontrib><creatorcontrib>Moseley, S.J.</creatorcontrib><creatorcontrib>Smela, E.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE/IET Electronic Library</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><jtitle>Journal of microelectromechanical systems</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Delille, R.</au><au>Urdaneta, M.G.</au><au>Moseley, S.J.</au><au>Smela, E.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Benchtop Polymer MEMS</atitle><jtitle>Journal of microelectromechanical systems</jtitle><stitle>JMEMS</stitle><date>2006-10-01</date><risdate>2006</risdate><volume>15</volume><issue>5</issue><spage>1108</spage><epage>1120</epage><pages>1108-1120</pages><issn>1057-7157</issn><eissn>1941-0158</eissn><coden>JMIYET</coden><abstract>Loctite photopatternable adhesives 3108, 3340, and 3525 are introduced for microelectromechanical systems (MEMS) applications. These materials are patterned within minutes by exposure to ultraviolet (UV) light followed by rinsing with a solvent; no further processing is required. Because the uncured fluid is relatively insensitive to room light, this can be done on any lab bench without the requirement for a clean room. The materials can be spin-coated to obtain films, or cast between spacers for layers up to 1 cm thick, and the cured polymers range from elastomeric to rigid. These adhesives are of interest for rapid, inexpensive fabrication of relatively low-resolution features (tens to hundreds of micrometers) by photocuring. They can alternatively be molded, like polydimethylsiloxane (PDMS), to achieve high resolution, as well as irreversibly bonded after an O 2 plasma treatment. In addition, like SU8, they can be used as molds for patterning PDMS. Initial characterization of resolution, swelling, and biocompatibility were performed. One of the polymers, 3340, can be used for packaging bioMEMS-on-complementary-metal-oxide-semiconductor (CMOS) chips, exploiting its biocompatibility and its photopatternability at thicknesses of 1500 mum to cover the bond wires while exposing the chip surface. As further demonstrations of the versatility of these materials, multilevel, interconnected channel structures were fabricated with a gelatin sacrificial layer, and magnetic films were prepared, since the polymers remain patternable even with additives</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/JMEMS.2006.882610</doi><tpages>13</tpages></addata></record> |
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subjects | Adhesives Biocompatibility Bonding Channels Chips elastomer Exact sciences and technology Fabrication Instruments, apparatus, components and techniques common to several branches of physics and astronomy Magnetic materials Mechanical instruments, equipment and techniques Microelectromechanical systems Micromechanical devices Micromechanical devices and systems Micrometers negative resist Packaging photopatternable Physics Plasma applications Polymer Polymer films Polymers R&D rapid prototyping Research & development Silicone resins Solvents Wires |
title | Benchtop Polymer MEMS |
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