Surface chemistry of Al(CH3)3 and TiCl4 on GaAs(100) and InGaAs during the first half-cycle of atomic layer deposition

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Saved in:
Bibliographic Details
Published in:Microscopy and microanalysis 2012-07, Vol.18 (S2), p.906-907
Main Authors: Granados, B., Lie, F., Muscat, A.
Format: Article
Language:English
Subjects:
Fluorides
Instrumentation Symposium
Semiconductors
Surface and Subsurface Analysis-07
Surface chemistry
Transistors
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.
ISSN:1431-9276
1435-8115
DOI:10.1017/S1431927612006381