Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate

C–F polymer redeposition is generated on the etched sidewall of the patterned air-bearing surface (ABS). This C–F polymer is a by-product from fluorine-based plasma using a Surface Technology Systems multiplex-pro air-bearing etch (ABE). The morphology of the re-deposition and the composite element...

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Bibliographic Details
Published in:Journal of nanomaterials 2013-01, Vol.2013 (2013), p.1-6
Main Authors: Siangchaew, Krisda, Pakpum, Chupong, Patthanasettakul, V., Limcharoen, Alonggot
Format: Article
Language:English
Subjects:
Carbon
Chemical reactions
Chemistry
Disk drives
Electrodes
Fluorine
Nanomaterials
Perfluorocarbons
Science
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Summary:C–F polymer redeposition is generated on the etched sidewall of the patterned air-bearing surface (ABS). This C–F polymer is a by-product from fluorine-based plasma using a Surface Technology Systems multiplex-pro air-bearing etch (ABE). The morphology of the re-deposition and the composite element was observed by a scanning electron microscope (SEM). The chemical bonding results were characterised via X-ray photoelectron spectroscopy, attenuated total reflected infrared spectroscopy and visible Raman spectroscopy. The purpose of this work is to demonstrate a modification of AlF3 re-deposition to C–F polymer re-deposition, which is easily stripped out by an isopropyl alcohol-based solution. The benefit of this research is the removal of the re-deposition in the resist strip process without additional cleaning process steps.
ISSN:1687-4110
1687-4129
DOI:10.1155/2013/851489