Sulfonic Acid Ester Unit-containing Polymers for Surface Modification Resist

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 1998, Vol.11(4), pp.641-644
Main Authors: Shirai, Masamitsu, Nakanishi, Junji, Tsunooka, Masahiro, Matsuo, Takahiro, Endo, Masayuki
Format: Article
Language:English
Subjects:
dry development
photoresist
sulfonic acid ester
surface modification
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.11.641