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Development of Novel Photoresist Polymer

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Bibliographic Details
Published in:	Journal of Photopolymer Science and Technology 1999, Vol.12(1), pp.173-176
Main Authors:	Miyake, Hiroto, Tanigawa, Hiroto, Okumura, Koichi, Nagashima, Yasuhiro, Maruo, Katsuya, Kobayashi, Kenji, Fukui, Yoshitaka
Format:	Article
Language:	English
Subjects:	acrylic resin cycloalphatic epoxide photoresist
Citations:	Items that cite this one
Online Access:	Get full text
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