Cyclocopolymer of N-cyclohexyldimethacrylamide and Application to a Photoresist with Photo-Acid Generator

The cyclized copolymers from N-cyclohexyldimethacrylamide (CHDMA) with t-butyl methacrylate (tBuMA) or tetrahydropyranyl methacrylate (THPMA) were synthesized. These copolymerizations occurred by general technique of radical polymerization and CHDMA mainly proceeded the cyclized reaction. The copoly...

Full description

Saved in:
Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2000, Vol.13(5), pp.703-709
Main Authors: Takao, Yasuyuki, Miyagawa, Nobukazu, Takahara, Shigeru, Yamaoka, Tsuguo
Format: Article
Language:English
Subjects:
cyclized copolymerization
cyclocopolymer
N-substituted dimethacrylamide
photoresist
Citations: Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The cyclized copolymers from N-cyclohexyldimethacrylamide (CHDMA) with t-butyl methacrylate (tBuMA) or tetrahydropyranyl methacrylate (THPMA) were synthesized. These copolymerizations occurred by general technique of radical polymerization and CHDMA mainly proceeded the cyclized reaction. The copolymers have high transmittance at 248nm. These copolymers indicated high thermal property due to the cyclic structure in the main chain. The ester unit of the side chain was easily cleaved by baking with acid catalyst. The acid reaction was dependent on a number of methacrylate units and a kind of ester group. However, the cyclized unit from CHDMA was no changed on this process. We applied these copolymers to photoresist based on the chemically amplified system with PAG and obtained patterns of positive-tone image.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.13.703