High-sensitive Negative Resist Materials Based on Polysilane Derivatives

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2000, Vol.13(3), pp.395-396
Main Authors: Seki, Shu, Kunimi, Yoshihisa, Sakurai, Yusuke, Tsuji, Shou, Maeda, Kensaku, Tagawa, Seiichi
Format: Article
Language:English
Subjects:
electron beam
negative resist
polysilane
positive resist
X-rays
γ-rays
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.13.395