Organic-Inorganic Hybrid Type Electron Beam Resist

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2001, Vol.14(2), pp.185-188
Main Authors: Tamai, Toshiyuki, Matsuura, Yukihito, Matsukawa, Kimihiro, Inoue, Hiroshi, Hamamoto, Tetsuya, Toyota, Hiroshi, Satoh, Kazuo
Format: Article
Language:English
Subjects:
EB Resist
Lithography
Organic-Inorganic Hybrid
Reactive Ion Etching
Sol-Gel Process
Online Access:Get full text
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.14.185