Design Considerations for Anti-reflection Layer in Thin Imaging System

Polymers based on biphenyl methacrylate as chromophore were synthesized with different compositions for use as anti-reflective coating (ARC) in KrF lithography. These polymers were formulated with a melamine cross-linker and a thermally activated acidic catalyst. The absorption characteristics of th...

Full description

Saved in:
Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2001, Vol.14(3), pp.489-494
Main Authors: Malik, Sanjay, De, Binod, Biafore, John, Spaziano, Greg, Sarubbi, Tom, Dilocker, Stephanie, Bowden, Murrae, Reybrouc, Mario, Grozev, Grozdan, Driessche, Veerle van, Tzviatkov, Plamen
Format: Article
Language:English
Subjects:
antireflection coating
chemical amplification
DUV lithography
thin imaging system
Citations: Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Polymers based on biphenyl methacrylate as chromophore were synthesized with different compositions for use as anti-reflective coating (ARC) in KrF lithography. These polymers were formulated with a melamine cross-linker and a thermally activated acidic catalyst. The absorption characteristics of these polymers were adjusted by changing the monomer composition. The optimum ranges of n and k for the ARC were found to be 1.56 to 1.76 and 0.125 to 0.275, respectively. The curing properties of the coatings were studied by appropriate thermal analytical techniques. The desired degree of cross-linking was achieved by varying the amount of curing agent and temperature of curing. Fine lithographic patterns could be printed with no footing and scum at imaging layer-ARC interface.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.14.489