Novel Fluoropolymers for Use in 157nm Lithography

Unexpectedly good UV transmittance at 157nm of poly(norbornene sulfone) bearing a pendant hexafluoroisopropanol functionality has prompted us to employ this fluoroalcohol as an acid group for the design of chemical amplification resists for use in 157nm lithography. The backbone structures to which...

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2001, Vol.14(4), pp.583-593
Main Authors: Ito, H., Wallraff, G. M., Fender, N., Brock, P. J., Larson, C. E., Truong, H. D., Breyta, G., Miller, D. C., Sherwood, M. H., Allen, R. D.
Format: Article
Language:English
Subjects:
157nm lithography
aqueous base development
chemical amplification
hexafluoroisopropanol
inverse-gated 13C-NMR
norbornene
quartz crystal microbalance
radical copolymerization kinetics
α-trifluoromethylacrylic monomers
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Summary:Unexpectedly good UV transmittance at 157nm of poly(norbornene sulfone) bearing a pendant hexafluoroisopropanol functionality has prompted us to employ this fluoroalcohol as an acid group for the design of chemical amplification resists for use in 157nm lithography. The backbone structures to which the hexafluoroalcohol group is attached are polynorbornene and polystyrene. Furthermore, our discovery that poly(methyl α-trifluoromethylacrylate) is adequately transparent at 157nm has led us to incorporate the α-trifluoromethylacrylic unit in the polymer backbone by radical copolymerization with styrenes and norbornenes. Thus, four platforms are currently available to us in preparation of 157nm resist polymers; 1) all-acrylic, 2) all-norbornene, 3) acrylic-norbornene, and 4) acrylic-styrenic systems.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.14.583