Electron Beam-Induced Reactions of a Sulfonium Salt in the Solid State for Chemically Amplified Electron Beam Resists; Comparison with Photolytic Reactions

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2002, Vol.15(3), pp.423-426
Main Authors: Moon, Seong-Yun, Maekawa, Yasunari, Yoshida, Masaru
Format: Article
Language:English
Subjects:
deep UV
electron beam
photoacid generator
resist
sulfonium salt
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.15.423