Recent Progress of Lithographic Microfabrication by the TPA-Induced Photopolymerization

• Published in: Journal of Photopolymer Science and Technology 2004, Vol.17(3), pp.385-392
• Main Authors: Yang, Hyun-Kwan, Kim, Moon-Soo, Kang, Seung-Wan, Kim, Kyoung-Soo, Lee, Kwang-Sup, Park, Sang Hu, Yang, Dong-Yoi, Kong, Hong Jin, Sun, Hong-Bo, Kawata, Satoshio, Fleits, Paul
• Format: Article
• Language: English
• Subjects: 3D microfabrication; Two-photon absorption; Two-photon initiated photopolymerization
• ISSN: 0914-9244; 1349-6336
• DOI: 10.2494/photopolymer.17.385

Several different structures of micro-objects were fabricated by two-photon initiated photopolymerization using newly synthesized chromophore whose structures have been engineered for high two-photon activity. A raster graphics type voxel matrix scanning (VMS) scheme allowed fabrication of two-dimensional (2D) micro-object from a bitmap format figure. Using this technique along with the vacuum pressure discrepancy technique, nano-precision polydimethylsiloxane (PDMS) replica has been fabricated from it original PDMS mold that was originally prepared by two-photon initiated photopolymerization of soft-resin. For better result in photonic crystal fabrication, a quantized-pixel laser writing scheme was employed. A complicated sub-micron 3D photonic lattice was fabricated with high reproducibility. In order to enhance physical/mechanical stability of resulting micro-object, we have tested a new material system which consists of sol-gel precursor and photo-crosslinking of soft-resin. The physical/mechanical stability of micro-object was enhanced greatly by introducing the formation of silica glass interpenetrating network with organic polymer resin.