Novel Molecular Photo-resists Based on the Cyclodextrin Derivatives Containing Fluorine Atoms and t-Butyl Ester Groups

• Published in: Bulletin of the Chemical Society of Japan 2005-04, Vol.78 (4), p.731-737
• Main Authors: Kudo, Hiroto, Inoue, Naomi, Nishimura, Isao, Nishikubo, Tadatomi
• Format: Article
• Language: English
• ISSN: 0009-2673; 1348-0634
• DOI: 10.1246/bcsj.78.731

In this paper, we describe the syntheses, properties, and photo-induced deprotection of β-CD derivatives containing t-butyl ester groups and fluorine atoms. The β-CD derivative was obtained from the reaction of β-CD and t-butyl-α-(trifluoromethyl)acrylate. The obtained β-CD derivative had excellent solubility, good film-forming property, high thermal stability, and good transmittance with the VUV spectra. When the photo-chemical reaction of the β-CD derivative was performed with a photo acid generator in the film state upon UV irradiation, it was found that the photoinduced deprotection of t-butyl ester groups and decomposition of acetal moieties of gluconopyranose unit proceeded smoothly. Furthermore, we examined the patterning property of the β-CD derivative as the photo resist using triphenylsulfonium fluorosulfonate as a photo acid generator, and 2-heptanone as the solvent. From this result, it was observed that the resolution of a 100 nm line and space pattern could be obtained.