A Simple Method for Fabrication of Mesoporous Films Using a Rapid Heating Process

Mesoporous silica SBA-15 and SBA-16 films can be successfully prepared on a substrate by a simple method involving a rapid heating process, which is controlled by a voltage applied to a heating electrode on the substrate. This advantageous method has considerable potential for electronic device fabr...

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Bibliographic Details
Published in:Chemistry letters 2005-03, Vol.34 (3), p.328-329
Main Authors: Yamada, Takeo, Zhou, Haoshen, Honma, Itaru, Ueno, Yuko, Horiuchi, Tsutomu, Niwa, Osamu
Format: Article
Language:English
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Summary:Mesoporous silica SBA-15 and SBA-16 films can be successfully prepared on a substrate by a simple method involving a rapid heating process, which is controlled by a voltage applied to a heating electrode on the substrate. This advantageous method has considerable potential for electronic device fabrication processes.
ISSN:0366-7022
1348-0715
DOI:10.1246/cl.2005.328