Loading…

Direct UV-Imprinting of Hybrid-Polymer Photonic Microring Resonators and Their Characterization

The direct patterning of hybrid-polymer microring resonators with minimal residual layers by UV-assisted nanoimprint lithography is reported. The proposed stamp-and-repeat technology requires no post-processing. The imprint polymer was applied by spin-coating as a 130-150 nm thin initial film for an...

Full description

Saved in:
Bibliographic Details
Published in:Journal of lightwave technology 2014-05, Vol.32 (9), p.1674-1681
Main Authors: Kirchner, Robert, Finn, Andreas, Landgraf, Rene, Nueske, Lutz, Lichao Teng, Vogler, Marko, Fischer, Wolf-Joachim
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The direct patterning of hybrid-polymer microring resonators with minimal residual layers by UV-assisted nanoimprint lithography is reported. The proposed stamp-and-repeat technology requires no post-processing. The imprint polymer was applied by spin-coating as a 130-150 nm thin initial film for an optimized processing. The importance of the initial film thickness is discussed in detail. Aspect ratios of more than 5:1 were realized with 2 μm high ridge-waveguides and sub-400 nm coupling gaps on maximal 130 nm thin residual layers. The achieved ratio of structure height to residual layer thickness of 15.4 (2 μm versus 130 nm) was much larger than the typical values in high-resolution imprinting and superseded the removal of the residual layer completely. The resonators are thought as biosensor transducers. High quality devices with Q-factors up to 13000 were produced with a minimal set of process steps.
ISSN:0733-8724
1558-2213
DOI:10.1109/JLT.2014.2310054