Infrared Absorption Films Developed by Copper Electroplating with Chemical Etching and Subsequent Blackening

High infrared-absorption films having low cost and light weight are indispensable for infrared sensors. We developed IR-adsorption coatings with low-reflectance and low-transmittance at wavelengths of 3–13 µm, based on a copper electroplating film pretreated with chemical etching and subsequent blac...

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Bibliographic Details
Published in:Denki kagaku oyobi kōgyō butsuri kagaku 2014/09/05, Vol.82(9), pp.752-754
Main Authors: ARAKAWA, Tomiyuki, WATANABE, Nobuaki, OSHIKIRI, Junki, KOIWA, Ichiro
Format: Article
Language:English
Subjects:
Black Film
Cu Electroplating
Electroless Ni-P Plating
Infrared Absorber
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Summary:High infrared-absorption films having low cost and light weight are indispensable for infrared sensors. We developed IR-adsorption coatings with low-reflectance and low-transmittance at wavelengths of 3–13 µm, based on a copper electroplating film pretreated with chemical etching and subsequent blackening. The chemical etching and blackening respectively produced columnar and feather-shaped structures on a copper surface. The reflectance and the transmittance of the films were below 15% and below 1% at wavelengths of 3–13 µm, respectively. The current coating technique might be useful to develop high absorption, low cost, and lightweight infrared absorbers.
ISSN:1344-3542
2186-2451
DOI:10.5796/electrochemistry.82.752