X-ray diffraction by phase diffraction gratings

The diffraction properties of phase gratings with the period D = 1.6, 1.0 and 0.5 µm fabricated on an Si(111) crystal by e‐beam lithography were studied by triple‐axis X‐ray diffraction. A 100 nm‐thick tungsten layer was used as a phase‐shift layer. It is shown that the presence of a grating as a ph...

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Bibliographic Details
Published in:Journal of applied crystallography 2015-08, Vol.48 (4), p.1159-1164
Main Authors: Irzhak, D. V., Knyasev, M. A., Punegov, V. I., Roshchupkin, D. V.
Format: Article
Language:English
Subjects:
Bragg diffraction
Crystallography
Diffraction
modulated X-ray fields
phase-shift diffraction gratings
triple-axis diffractometers
X-ray diffraction
X-rays
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Summary:The diffraction properties of phase gratings with the period D = 1.6, 1.0 and 0.5 µm fabricated on an Si(111) crystal by e‐beam lithography were studied by triple‐axis X‐ray diffraction. A 100 nm‐thick tungsten layer was used as a phase‐shift layer. It is shown that the presence of a grating as a phase‐shift W layer on the surface of the Si(111) crystal causes the formation of a complicated two‐dimensional diffraction pattern related to the diffraction of X‐rays on the phase grating at the X‐ray entrance and exit from the crystal. A model of X‐ray diffraction on the W phase diffraction grating is proposed.
ISSN:1600-5767
0021-8898
1600-5767
DOI:10.1107/S1600576715011607