Atomic-scale thermal behavior of nanoimprinted 0.3-nm-high step patterns on PMMA polymer sheets

A 0.3-nm-high step pattern was formed on a poly(methyl methacrylate) (PMMA) polymer surface by thermal nanoimprinting a sapphire template. Large-area transcription was attained under the condition of ~0.2 MPa load for 300 s at 120 °C. We also observed the thermal deformation of the atomically steppe...

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Bibliographic Details
Published in:Polymer journal 2016-02, Vol.48 (2), p.225-227
Main Authors: Tan, Goon, Nozawa, Yasuhisa, Funabasama, Tomoyuki, Koyama, Koji, Mita, Masahiro, Kaneko, Satoru, Komura, Motonori, Matsuda, Akifumi, Yoshimoto, Mamoru
Format: Article
Language:English
Subjects:
639/301
639/925
Biomaterials
Bioorganic Chemistry
Chemistry
Chemistry and Materials Science
Chemistry/Food Science
Polymer Sciences
Surfaces and Interfaces
Thin Films
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Summary:A 0.3-nm-high step pattern was formed on a poly(methyl methacrylate) (PMMA) polymer surface by thermal nanoimprinting a sapphire template. Large-area transcription was attained under the condition of ~0.2 MPa load for 300 s at 120 °C. We also observed the thermal deformation of the atomically stepped pattern formed on a PMMA surface by in situ atomic force microscopy at high temperature and found the atomic step pattern was stable near the imprinting temperature of 120 °C and also at about 20 °C higher than the bulk glass transition temperature of PMMA (105 °C).
ISSN:0032-3896
1349-0540
DOI:10.1038/pj.2015.99