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Effect of Polarization Coulomb Field Scattering on Parasitic Source Access Resistance and Extrinsic Transconductance in AlGaN/GaN Heterostructure FETs
With the measured parasitic source access resistance under a different forward gate-source current for the AlGaN/GaN heterostructure FETs (HFETs) with different device sizes, the variation of the measured parasitic source access resistance with the polarization charge distribution at the AlGaN/GaN i...
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Published in: | IEEE transactions on electron devices 2016-04, Vol.63 (4), p.1471-1477 |
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creator | Yang, Ming Lin, Zhaojun Zhao, Jingtao Cui, Peng Fu, Chen Lv, Yuanjie Feng, Zhihong |
description | With the measured parasitic source access resistance under a different forward gate-source current for the AlGaN/GaN heterostructure FETs (HFETs) with different device sizes, the variation of the measured parasitic source access resistance with the polarization charge distribution at the AlGaN/GaN interface was compared and analyzed. It is found that the variation of the parasitic source access resistance originates from the polarization Coulomb field (PCF) scattering, and the effect of PCF scattering on the parasitic source access resistance is more significant for the device with a longer gate length or a shorter gate-source distance. The behaviors of the measured extrinsic transconductance for the fabricated AlGaN/GaN HFETs confirm the effect of PCF scattering. The possibility is demonstrated to take advantage of this effect to improve the performance of AlGaN/GaN HFETs. |
doi_str_mv | 10.1109/TED.2016.2532919 |
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fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_1787011954</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>7425193</ieee_id><sourcerecordid>4046109081</sourcerecordid><originalsourceid>FETCH-LOGICAL-c291t-3d0c5de7a60f1a501b2c35fda24789572dd8e9ebae9db212aacb1540dfd90d803</originalsourceid><addsrcrecordid>eNo9UE1LJDEQDeLCjrr3BS8Bzz0m6U535ziMMyqIyjp7bqqTaom0HU3SoPtD9vdaMuKhKKree_XxGPstxVJKYc53m4ulErJeKl0qI80BW0itm8LUVX3IFkLItjBlW_5kRyk9UVlXlVqw_5thQJt5GPh9GCH6f5B9mPg6zGN47vnW4-j4g4WcMfrpkRN2DxGSz97yhzBHi3xlLabE_2DyKcNEHZgc37xlUiSi7SJMyYbJzXYP-4mvxku4PafgV0ijQ8qR0Dki32526YT9GGBM-OsrH7O_1F5fFTd3l9fr1U1h6cdclE5Y7bCBWgwStJC9sqUeHKiqaY1ulHMtGuwBjeuVVAC2l7oSbnBGuFaUx-xsP_clhtcZU-6e6KWJVnayaRshpdEVscSeZenOFHHoXqJ_hvjeSdF9ut-R-92n-92X-yQ53Us8In7Tm0ppAssPBCuDLA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1787011954</pqid></control><display><type>article</type><title>Effect of Polarization Coulomb Field Scattering on Parasitic Source Access Resistance and Extrinsic Transconductance in AlGaN/GaN Heterostructure FETs</title><source>IEEE Electronic Library (IEL) Journals</source><creator>Yang, Ming ; Lin, Zhaojun ; Zhao, Jingtao ; Cui, Peng ; Fu, Chen ; Lv, Yuanjie ; Feng, Zhihong</creator><creatorcontrib>Yang, Ming ; Lin, Zhaojun ; Zhao, Jingtao ; Cui, Peng ; Fu, Chen ; Lv, Yuanjie ; Feng, Zhihong</creatorcontrib><description>With the measured parasitic source access resistance under a different forward gate-source current for the AlGaN/GaN heterostructure FETs (HFETs) with different device sizes, the variation of the measured parasitic source access resistance with the polarization charge distribution at the AlGaN/GaN interface was compared and analyzed. It is found that the variation of the parasitic source access resistance originates from the polarization Coulomb field (PCF) scattering, and the effect of PCF scattering on the parasitic source access resistance is more significant for the device with a longer gate length or a shorter gate-source distance. The behaviors of the measured extrinsic transconductance for the fabricated AlGaN/GaN HFETs confirm the effect of PCF scattering. The possibility is demonstrated to take advantage of this effect to improve the performance of AlGaN/GaN HFETs.</description><identifier>ISSN: 0018-9383</identifier><identifier>EISSN: 1557-9646</identifier><identifier>DOI: 10.1109/TED.2016.2532919</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>AlGaN/GaN heterostructure FETs (HFETs) ; Aluminum gallium nitride ; extrinsic transconductance ; HEMTs ; Logic gates ; MODFETs ; parasitic source access resistance ; polarization Coulomb field (PCF) scattering ; Resistance ; Scattering ; Wide band gap semiconductors</subject><ispartof>IEEE transactions on electron devices, 2016-04, Vol.63 (4), p.1471-1477</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2016</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c291t-3d0c5de7a60f1a501b2c35fda24789572dd8e9ebae9db212aacb1540dfd90d803</citedby><cites>FETCH-LOGICAL-c291t-3d0c5de7a60f1a501b2c35fda24789572dd8e9ebae9db212aacb1540dfd90d803</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/7425193$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,54796</link.rule.ids></links><search><creatorcontrib>Yang, Ming</creatorcontrib><creatorcontrib>Lin, Zhaojun</creatorcontrib><creatorcontrib>Zhao, Jingtao</creatorcontrib><creatorcontrib>Cui, Peng</creatorcontrib><creatorcontrib>Fu, Chen</creatorcontrib><creatorcontrib>Lv, Yuanjie</creatorcontrib><creatorcontrib>Feng, Zhihong</creatorcontrib><title>Effect of Polarization Coulomb Field Scattering on Parasitic Source Access Resistance and Extrinsic Transconductance in AlGaN/GaN Heterostructure FETs</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>With the measured parasitic source access resistance under a different forward gate-source current for the AlGaN/GaN heterostructure FETs (HFETs) with different device sizes, the variation of the measured parasitic source access resistance with the polarization charge distribution at the AlGaN/GaN interface was compared and analyzed. It is found that the variation of the parasitic source access resistance originates from the polarization Coulomb field (PCF) scattering, and the effect of PCF scattering on the parasitic source access resistance is more significant for the device with a longer gate length or a shorter gate-source distance. The behaviors of the measured extrinsic transconductance for the fabricated AlGaN/GaN HFETs confirm the effect of PCF scattering. The possibility is demonstrated to take advantage of this effect to improve the performance of AlGaN/GaN HFETs.</description><subject>AlGaN/GaN heterostructure FETs (HFETs)</subject><subject>Aluminum gallium nitride</subject><subject>extrinsic transconductance</subject><subject>HEMTs</subject><subject>Logic gates</subject><subject>MODFETs</subject><subject>parasitic source access resistance</subject><subject>polarization Coulomb field (PCF) scattering</subject><subject>Resistance</subject><subject>Scattering</subject><subject>Wide band gap semiconductors</subject><issn>0018-9383</issn><issn>1557-9646</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNo9UE1LJDEQDeLCjrr3BS8Bzz0m6U535ziMMyqIyjp7bqqTaom0HU3SoPtD9vdaMuKhKKree_XxGPstxVJKYc53m4ulErJeKl0qI80BW0itm8LUVX3IFkLItjBlW_5kRyk9UVlXlVqw_5thQJt5GPh9GCH6f5B9mPg6zGN47vnW4-j4g4WcMfrpkRN2DxGSz97yhzBHi3xlLabE_2DyKcNEHZgc37xlUiSi7SJMyYbJzXYP-4mvxku4PafgV0ijQ8qR0Dki32526YT9GGBM-OsrH7O_1F5fFTd3l9fr1U1h6cdclE5Y7bCBWgwStJC9sqUeHKiqaY1ulHMtGuwBjeuVVAC2l7oSbnBGuFaUx-xsP_clhtcZU-6e6KWJVnayaRshpdEVscSeZenOFHHoXqJ_hvjeSdF9ut-R-92n-92X-yQ53Us8In7Tm0ppAssPBCuDLA</recordid><startdate>201604</startdate><enddate>201604</enddate><creator>Yang, Ming</creator><creator>Lin, Zhaojun</creator><creator>Zhao, Jingtao</creator><creator>Cui, Peng</creator><creator>Fu, Chen</creator><creator>Lv, Yuanjie</creator><creator>Feng, Zhihong</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>201604</creationdate><title>Effect of Polarization Coulomb Field Scattering on Parasitic Source Access Resistance and Extrinsic Transconductance in AlGaN/GaN Heterostructure FETs</title><author>Yang, Ming ; Lin, Zhaojun ; Zhao, Jingtao ; Cui, Peng ; Fu, Chen ; Lv, Yuanjie ; Feng, Zhihong</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c291t-3d0c5de7a60f1a501b2c35fda24789572dd8e9ebae9db212aacb1540dfd90d803</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><topic>AlGaN/GaN heterostructure FETs (HFETs)</topic><topic>Aluminum gallium nitride</topic><topic>extrinsic transconductance</topic><topic>HEMTs</topic><topic>Logic gates</topic><topic>MODFETs</topic><topic>parasitic source access resistance</topic><topic>polarization Coulomb field (PCF) scattering</topic><topic>Resistance</topic><topic>Scattering</topic><topic>Wide band gap semiconductors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yang, Ming</creatorcontrib><creatorcontrib>Lin, Zhaojun</creatorcontrib><creatorcontrib>Zhao, Jingtao</creatorcontrib><creatorcontrib>Cui, Peng</creatorcontrib><creatorcontrib>Fu, Chen</creatorcontrib><creatorcontrib>Lv, Yuanjie</creatorcontrib><creatorcontrib>Feng, Zhihong</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Xplore</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yang, Ming</au><au>Lin, Zhaojun</au><au>Zhao, Jingtao</au><au>Cui, Peng</au><au>Fu, Chen</au><au>Lv, Yuanjie</au><au>Feng, Zhihong</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of Polarization Coulomb Field Scattering on Parasitic Source Access Resistance and Extrinsic Transconductance in AlGaN/GaN Heterostructure FETs</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2016-04</date><risdate>2016</risdate><volume>63</volume><issue>4</issue><spage>1471</spage><epage>1477</epage><pages>1471-1477</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>With the measured parasitic source access resistance under a different forward gate-source current for the AlGaN/GaN heterostructure FETs (HFETs) with different device sizes, the variation of the measured parasitic source access resistance with the polarization charge distribution at the AlGaN/GaN interface was compared and analyzed. It is found that the variation of the parasitic source access resistance originates from the polarization Coulomb field (PCF) scattering, and the effect of PCF scattering on the parasitic source access resistance is more significant for the device with a longer gate length or a shorter gate-source distance. The behaviors of the measured extrinsic transconductance for the fabricated AlGaN/GaN HFETs confirm the effect of PCF scattering. The possibility is demonstrated to take advantage of this effect to improve the performance of AlGaN/GaN HFETs.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TED.2016.2532919</doi><tpages>7</tpages></addata></record> |
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subjects | AlGaN/GaN heterostructure FETs (HFETs) Aluminum gallium nitride extrinsic transconductance HEMTs Logic gates MODFETs parasitic source access resistance polarization Coulomb field (PCF) scattering Resistance Scattering Wide band gap semiconductors |
title | Effect of Polarization Coulomb Field Scattering on Parasitic Source Access Resistance and Extrinsic Transconductance in AlGaN/GaN Heterostructure FETs |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T12%3A34%3A58IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effect%20of%20Polarization%20Coulomb%20Field%20Scattering%20on%20Parasitic%20Source%20Access%20Resistance%20and%20Extrinsic%20Transconductance%20in%20AlGaN/GaN%20Heterostructure%20FETs&rft.jtitle=IEEE%20transactions%20on%20electron%20devices&rft.au=Yang,%20Ming&rft.date=2016-04&rft.volume=63&rft.issue=4&rft.spage=1471&rft.epage=1477&rft.pages=1471-1477&rft.issn=0018-9383&rft.eissn=1557-9646&rft.coden=IETDAI&rft_id=info:doi/10.1109/TED.2016.2532919&rft_dat=%3Cproquest_cross%3E4046109081%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c291t-3d0c5de7a60f1a501b2c35fda24789572dd8e9ebae9db212aacb1540dfd90d803%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=1787011954&rft_id=info:pmid/&rft_ieee_id=7425193&rfr_iscdi=true |