Effective Method for Decreasing Detection Limit of Dopant Concentration in Semiconductor Using Dual SDD Analysis System

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Bibliographic Details
Published in:Microscopy and microanalysis 2016-07, Vol.22 (S3), p.316-317
Main Authors: Fukunaga, K., Endo, N., Suzuki, M., Kondo, Y.
Format: Article
Language:English
Subjects:
Analytical and Instrumentation Science Symposia
Analytical Electron Microscopy for Advanced Characterization from Multi-Dimensional Data Acquisition to Integrated Analysis
Energy
Microscopy
Semiconductor doping
Sensors
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ISSN:1431-9276
1435-8115
DOI:10.1017/S1431927616002439