The influence of photoelectron processes in a semiconductor substrate on the adsorption of polycationic and polyanionic molecules

White-light illumination during the adsorption of polyanionic molecules of glucose oxidase (GO x ) enzyme on the surface of p -Si/SiO 2 /polyethylenimine structure leads to a threefold decrease in the surface concentration of GO x molecules. Same illumination during the GO x adsorption on the n -Si/...

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Bibliographic Details
Published in:Technical physics letters 2017-03, Vol.43 (3), p.285-288
Main Authors: Stetsyura, S. V., Kozlowski, A. V.
Format: Article
Language:English
Subjects:
Adsorption
Classical and Continuum Physics
Electron states
Electron transfer
Glucose oxidase
Illumination
Luminous intensity
Molecular structure
Photoelectrons
Physics
Physics and Astronomy
Polyethyleneimine
Silicon dioxide
White light
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Summary:White-light illumination during the adsorption of polyanionic molecules of glucose oxidase (GO x ) enzyme on the surface of p -Si/SiO 2 /polyethylenimine structure leads to a threefold decrease in the surface concentration of GO x molecules. Same illumination during the GO x adsorption on the n -Si/SiO 2 /PEI structure leads to a sevenfold increase in the surface concentration of enzyme molecules. Changes in the amount of adsorbed GO x molecules depending on the intensity of irradiation are explained by electron transfer processes and recharging of electronic states at the Si/SiO 2 interface and within SiO 2 layer.
ISSN:1063-7850
1090-6533
DOI:10.1134/S1063785017030233