Influence of coalescing aids on the latex properties and film formation of waterborne coatings

ABSTRACT Coalescing aids are organic solvents that are widely used to accommodate the film formation of waterborne coatings. The influence of the volatility, hydrophilicity, and amount of coalescing aids on the properties of waterborne dispersions and the dynamics of film formation was investigated....

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Bibliographic Details
Published in:Journal of applied polymer science 2017-08, Vol.134 (31), p.n/a
Main Authors: Berce, Peter, Skale, Saša, Razboršek, Tina, Slemnik, Mojca
Format: Article
Language:English
Subjects:
Aids
Coalescing
Coatings
colloids
Dispersions
Electrochemical impedance spectroscopy
electrochemistry
Hardness tests
Hydrophilicity
Indentation
Latex
Materials science
Polymers
rheology
Solvation
Solvent retention
Solvents
Water resistance
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Summary:ABSTRACT Coalescing aids are organic solvents that are widely used to accommodate the film formation of waterborne coatings. The influence of the volatility, hydrophilicity, and amount of coalescing aids on the properties of waterborne dispersions and the dynamics of film formation was investigated. The results show that coalescing aids increased the viscosity through particle swelling and solvation, with the effect being stronger with more hydrophilic solvents. The results obtained with electrochemical impedance spectroscopy (EIS) and indentation tests show that hydrophilic coalescing aids were more efficient because of the partitioning on the particle interfaces but they could temporarily decrease the water resistance. The ease of coalescence was countered by solvent retention, which complicated the dynamics of film formation. EIS was used to optimize a real‐world coating formulation and identify the pitfalls arising from the complex dynamics of film formation. The best resistance to humidity was obtained with a combination of hydrophobic and hydrophilic coalescing aids. © 2017 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2017, 134, 45142.
ISSN:0021-8995
1097-4628
DOI:10.1002/app.45142