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Investigating the influence of F− on U4+ in molten LiCl–KCl–UF4 system and electro-deposition of U

Electrochemical behaviors of U 4+ in LiCl–KCl–UF 4 eutectic and deposition of U metal were investigated. It was found that the presence of F − has influence on the diffusion of U 3+ and U 4+ as comparing to data obtained in pure chloride molten salts. Electrochemical deposition of U was carried out...

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Published in:Journal of radioanalytical and nuclear chemistry 2017-06, Vol.312 (3), p.479-485
Main Authors: Zhu, Tiejian, Huang, Wei, Zheng, Haiyang, She, Changfeng, Jiang, Feng, Wang, Xianbin, Yu, Gong, Long, Dewu, Li, Qingnuan
Format: Article
Language:English
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Summary:Electrochemical behaviors of U 4+ in LiCl–KCl–UF 4 eutectic and deposition of U metal were investigated. It was found that the presence of F − has influence on the diffusion of U 3+ and U 4+ as comparing to data obtained in pure chloride molten salts. Electrochemical deposition of U was carried out by using pulse current electrolysis. Characterization results indicate that U metal was obtained at the cathode, implying U metal can be directly deposited from LiCl–KCl–UF 4 eutectic in this case and the extractive ratio is calculated to be 98%. Our results demonstrate feasible separation of U from LiCl–KCl–UF 4 molten salt by electrochemical method.
ISSN:0236-5731
1588-2780
DOI:10.1007/s10967-017-5242-x