P–26: Reducing the Tails in a Four‐Mask Process of Gen 8.5 LCDs

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Bibliographic Details
Published in:SID International Symposium Digest of technical papers 2017-05, Vol.48 (1), p.1323-1326
Main Authors: Liu, Xiao Di, Zeng, Li Mei, Wang, Mao Lin, Li, Wen Ying, Wang, Tian Hong, Kong, Xiang Yong, Chai, Li, Zeng, Mian, Liao, Cong Wei, Song, Li Wang, Chou, Yi Fang, Liu, Xiang, Lee, Chia Yu
Format: Article
Language:English
Subjects:
4-Mask process
amorphous silicon tail
four-mask
N+ tail
TFT structure design
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ISSN:0097-966X
2168-0159
DOI:10.1002/sdtp.11891