Effect of concurrent electron irradiation on the structure of deposited carbon films

Carbon films 110–180 nm thick are fabricated on nickel substrates by the ion sputtering of graphite with simultaneous electron irradiation and subsequent ion irradiation. Irradiation leads to the formation of bonds in the films in various proportions due to the sp and sp 3 hybridization of orbitals...

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Bibliographic Details
Published in:Surface investigation, x-ray, synchrotron and neutron techniques x-ray, synchrotron and neutron techniques, 2017-07, Vol.11 (4), p.807-813
Main Authors: Korshunov, S. N., Martynenko, Yu. V., Belova, N. E., Skorlupkin, I. D.
Format: Article
Language:English
Subjects:
Allotropes
Allotropy
Breakage
Carbon
Chemical bonds
Chemistry and Materials Science
Electron irradiation
Ion irradiation
Materials Science
Microhardness
Plasma
Reaction kinetics
Substrates
Surfaces and Interfaces
Thick films
Thin Films
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Summary:Carbon films 110–180 nm thick are fabricated on nickel substrates by the ion sputtering of graphite with simultaneous electron irradiation and subsequent ion irradiation. Irradiation leads to the formation of bonds in the films in various proportions due to the sp and sp 3 hybridization of orbitals ( sp -and sp 3 -bonds). Ion irradiation induces, to a greater extent, the formation of sp bonds, while concurrent electron irradiation increases the portion of sp 3 bonds. Electron and ion irradiation increases the film microhardness which reaches a value of 12 GPa. A model of the kinetics of creating carbon allotropes in a deposited film is proposed, which is based on the competition between the formation and breakage of carbon bonds during hybridization of different types. Electron and ion irradiation influence the probabilities of the formation and breakage of carbon bonds in the deposited film. The model provides a qualitative interpretation of the observed content ratios of carbon phases in the deposited film.
ISSN:1027-4510
1819-7094
DOI:10.1134/S1027451017040206