Magnetic Anisotropy and Damping for Monolayer-Controlled Co | Ni Epitaxial Multilayer

Structures and magnetic properties were systematically investigated for the monolayer (ML)-controlled Co | Ni multilayers with various Ni layer thicknesses, where the Co and Ni layers were epitaxially grown on a Al2 O3 (1120) single crystal substrate or deposited on a thermally oxidized Si substrate...

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Bibliographic Details
Published in:Journal of the Physical Society of Japan 2017-07, Vol.86 (7), p.74710
Main Authors: Seki, Takeshi, Shimada, Junpei, Iihama, Satoshi, Tsujikawa, Masahito, Koganezawa, Tomoyuki, Shioda, Akihiro, Tashiro, Takayuki, Zhou, Weinan, Mizukami, Shigemi, Shirai, Masafumi, Takanashi, Koki
Format: Article
Language:English
Subjects:
Aluminum oxide
Anisotropy
Cobalt
Damping
Epitaxial growth
Experiments
Magnetic anisotropy
Magnetic damping
Magnetic properties
Magnetism
Mathematical analysis
Multilayers
Silicon substrates
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Summary:Structures and magnetic properties were systematically investigated for the monolayer (ML)-controlled Co | Ni multilayers with various Ni layer thicknesses, where the Co and Ni layers were epitaxially grown on a Al2 O3 (1120) single crystal substrate or deposited on a thermally oxidized Si substrate. The epitaxial Co | Ni multilayers exhibited high uniaxial magnetic anisotropy energies (Ku) and low effective magnetic damping constants (αeff), resulting in the perpendicular magnetization with low damping even for the 1 ML-Ni | 1 ML-Co multilayer. By comparing the experimental results with the first principles calculation, we found that the Ni atoms largely contributed to the perpendicular anisotropy for the Co | Ni multilayers. We also discussed the possible mechanism dominating the magnitude of αeff for the Co | Ni multilayers based on the experiments and the calculations. The present results suggest that the epitaxial Co | Ni multilayer is a promising material to achieve high Ku and low magnetic damping simultaneously.
ISSN:0031-9015
1347-4073
DOI:10.7566/JPSJ.86.074710