Crystalline polarity of ZnO thin films deposited under dc external bias on various substrates

•External bias to substrates is significant to control the polarity of ZnO films.•Effect of polarity control depends on type of the substrates.•Difference of polarity in ZnO was critical to the film properties. Effects of the nature of substrates, either crystalline or non-crystalline, on the struct...

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Bibliographic Details
Published in:Journal of crystal growth 2017-04, Vol.463, p.38-45
Main Authors: Ohsawa, Takeo, Tsunoda, Kei, Dierre, Benjamin, Zellhofer, Caroline, Grachev, Sergey, Montigaud, Hervé, Ishigaki, Takamasa, Ohashi, Naoki
Format: Article
Language:English
Subjects:
Bias
Crystal structure
Defects
Lattice parameters
Magnetron sputtering
Oxides
Polarity
Properties (attributes)
Sapphire
Semiconducting II-VI materials
Silicon
Silicon dioxide
Silicon substrates
Substrates
Thin films
X-ray photoemission spectroscopy
Zinc oxide
Zinc oxides
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Summary:•External bias to substrates is significant to control the polarity of ZnO films.•Effect of polarity control depends on type of the substrates.•Difference of polarity in ZnO was critical to the film properties. Effects of the nature of substrates, either crystalline or non-crystalline, on the structure and properties of ZnO films deposited by sputtering were investigated. This study focuses mainly on the role of the external electric bias applied to substrates during magnetron sputtering deposition in controlling crystalline polarity, i.e., Zn-face or O-face, and the resulting film properties. It was found that polarity control was achieved on silica and silicon substrates but not on sapphire substrates. The substrate bias did influence the lattice parameters in the structural formation; however, the selection of the substrate type had a significant influence on the defect structures and the film properties.
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2017.01.048