SiOCH thin films deposited by chemical vapor deposition: From low-? to chemical and biochemical sensors

Significant advances have been made in the realization of porous SiOCH by chemical vapor deposition processes. In this paper, the different approaches developed to introduce porosity in an organosilicate thin films are described with a specific focus on the new concepts to obtain highly porous SiOCH...

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Bibliographic Details
Published in:Microelectronic engineering 2017-01, Vol.167, p.69
Main Authors: Jousseaume, V, El Sabahy, J, Yeromonahos, C, Castellan, G, Bouamrani, A, Ricoul, F
Format: Article
Language:English
Subjects:
Chemical sensors
Chemical vapor deposition
Dielectrics
Nanotechnology
Porosity
Thin films
Online Access:Get full text
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Summary:Significant advances have been made in the realization of porous SiOCH by chemical vapor deposition processes. In this paper, the different approaches developed to introduce porosity in an organosilicate thin films are described with a specific focus on the new concepts to obtain highly porous SiOCH by CVD and to simplify the existing processes. A second part of the paper is dedicated to the application of these porous SiOCH thin films in nanotechnologies: from low-κ dielectrics to chemical and biochemical sensors.
ISSN:0167-9317
1873-5568