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Annealing induced p-type conversion and substrate dependent effect of n-ZnO/p-Si heterostructure
•Successfully fabricated n-ZnO NRs/p-Si heterojunction by facile solution route.•Showed substrate resistivity dependent current-voltage response.•Extended thermal annealing found to reverse the conductivity type of ZnO.•Fabricated heterojunction showed excellent photovoltaic response. This paper rep...
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Published in: | Materials letters 2017-06, Vol.196, p.30-32 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | •Successfully fabricated n-ZnO NRs/p-Si heterojunction by facile solution route.•Showed substrate resistivity dependent current-voltage response.•Extended thermal annealing found to reverse the conductivity type of ZnO.•Fabricated heterojunction showed excellent photovoltaic response.
This paper reports the conductivity type conversion of ZnO nanorod thin film by annealing. The n-type conductivity of hydrothermally prepared ZnO nanorods was changed to p-type ZnO through thermal treatment in air ambient without doping process. The ZnO nanorod films were grown on p-Si (111) and p+-Si (100) substrates by hydrothermal method. SEM and XRD measurements showed the excellent crystalline quality and uniform morphology of the grown ZnO nanorod films. Furthermore, substrate and annealing temperature-dependent I-V responses of the films were also studied. A Schottky diode type behavior was shown by ZnO NRs grown on low resistive p-type silicon with a reasonable photoconversion efficiency. |
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ISSN: | 0167-577X 1873-4979 |
DOI: | 10.1016/j.matlet.2017.03.012 |