Collective processes in technological ion beams

A brief review of the author's proceedings is devoted to collective processes in technological positive ion beams and their influence on beam transportation features. General approaches to the problem of stability of stationary and pulsed beams with respect to the excitation of ion and electron...

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Bibliographic Details
Published in:IEEE transactions on plasma science 1997-08, Vol.25 (4), p.703-708
Main Author: Soloshenko, I.A.
Format: Article
Language:English
Subjects:
Electron beams
Electrons
Ion beams
Ionization
Ions
Particle beams
Plasma
Plasma sources
Plasma stability
Plasma transport processes
Poisson equations
Transportation
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Summary:A brief review of the author's proceedings is devoted to collective processes in technological positive ion beams and their influence on beam transportation features. General approaches to the problem of stability of stationary and pulsed beams with respect to the excitation of ion and electron oscillations are discussed. Spectra and increments of the oscillations are calculated. Nonlinear mechanisms limiting the oscillations' amplitude growth are established. The reverse action of oscillations on the beam transportation features is studied. The techniques of stabilization of beam instabilities are suggested.
ISSN:0093-3813
1939-9375
DOI:10.1109/27.640690