Evaluation of nanosilicon dioxide and chitosan on tissue culture of apple under agar-induced osmotic stress

In vitro, applications of nanosilicon dioxide (SiO 2 ) and chitosan were investigated for their effects on growth and proliferation of apple (Malus domestica Borkh. 'Gala') explants under osmotic stress induced by agar to simulate drought stress and under non-stressed conditions. The exper...

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Bibliographic Details
Published in:Journal of plant nutrition 2017-12, Vol.40 (20), p.2797-2807
Main Authors: Avestan, Saber, Naseri, Lotfali, Barker, Allen V.
Format: Article
Language:English
Subjects:
Agar
Chitosan
Drought
drought stress
explant proliferation
Explants
in vitro culture
Malus domestica
Osmosis
Osmotic stress
Plant growth
Silicon dioxide
Stresses
Tissue culture
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Summary:In vitro, applications of nanosilicon dioxide (SiO 2 ) and chitosan were investigated for their effects on growth and proliferation of apple (Malus domestica Borkh. 'Gala') explants under osmotic stress induced by agar to simulate drought stress and under non-stressed conditions. The experiment included five levels of SiO 2 (0, 25, 50, 100, and 200 mg L −1 ), two levels of chitosan (0 and 40 mg L −1 ), and two levels of agar (7 g L −1 and 9 g L −1 ) added to Murashige and Skoog medium. Under non-stressed conditions (7 g L −1 agar), application of SiO 2 at 50 or 100 mg −1 increased proliferation of apple explants. Use of 50 or 100 mg L −1 SiO 2 or 40 mg L −1 chitosan increased growth of apple explants under osmotic stress (9 g L −1 agar). This research suggests that use of SiO 2 or chitosan may improve plant growth and tolerance to stress.
ISSN:0190-4167
1532-4087
DOI:10.1080/01904167.2017.1382526