Morphology, structure, and mechanical properties of the surface of PbTe crystals after etching with H2O2–HBr–ethylene glycol solutions

The morphology and microstructure of PbTe surfaces polished with H 2 O 2 –HBr–ethylene glycol solutions have been studied by atomic force and electron microscopy techniques. The surface of PbTe single crystals after chemical–mechanical and dynamic chemical polishing with bromine-releasing etchants h...

Full description

Saved in:
Bibliographic Details
Published in:Inorganic materials 2017-12, Vol.53 (12), p.1233-1239
Main Authors: Malanych, G. P., Tomashyk, V. N., Lytvyn, O. S., Kolomys, O. F.
Format: Article
Language:English
Subjects:
Atomic force microscopy
Atomic structure
Bromine
Chemical compounds
Chemical polishing
Chemistry
Chemistry and Materials Science
Electron microscopy
Etchants
Ethylene glycol
Hydrogen peroxide
Industrial Chemistry/Chemical Engineering
Inorganic Chemistry
Intermetallic compounds
Lead base alloys
Lead tellurides
Materials Science
Mechanical properties
Microhardness
Microscopes
Morphology
Optical microscopy
Scanning electron microscopy
Single crystals
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The morphology and microstructure of PbTe surfaces polished with H 2 O 2 –HBr–ethylene glycol solutions have been studied by atomic force and electron microscopy techniques. The surface of PbTe single crystals after chemical–mechanical and dynamic chemical polishing with bromine-releasing etchants has been examined by optical microscopy and profilometry. The structural perfection and composition of the PbTe surface after chemical treatment have been determined by X-ray diffraction, scanning electron microscopy, and Raman spectroscopy. The mechanical properties of the crystals have been studied using microindentation. Using X-ray microanalysis, we have monitored the concentrations of the host elements (Pb and Te) and possible contamination with chemical compounds present in the etchants and the solutions used to rinse the samples.
ISSN:0020-1685
1608-3172
DOI:10.1134/S0020168517120093