RF-sputter deposited flexible copper oxide thin films for electrochemical energy storage

Flexible Cu–O thin films were grown on different metal coated non rigid polyimide substrates by the RF-magnetron sputtering and their microstructure and supercapacitive properties were studied. The Raman and XRD studies confirms the formation of a single Cu 2 O phase with predominant (111) orientati...

Full description

Saved in:
Bibliographic Details
Published in:Indian journal of physics 2018, Vol.92 (1), p.21-27
Main Authors: Purusottam Reddy, B., Sivajee Ganesh, K., Park, Si-Hyun, Hussain, O. M.
Format: Article
Language:English
Subjects:
Astrophysics and Astroparticles
Copper
Copper oxides
Energy storage
Kapton (trademark)
Magnetic properties
Magnetron sputtering
Original Paper
Physics
Physics and Astronomy
Planes
Platinum
Polyimide resins
Substrates
Thin films
Titanium
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Flexible Cu–O thin films were grown on different metal coated non rigid polyimide substrates by the RF-magnetron sputtering and their microstructure and supercapacitive properties were studied. The Raman and XRD studies confirms the formation of a single Cu 2 O phase with predominant (111) orientation. Surface topography observations revealed that as the percentage of lattice mismatch of Cu 2 O lattice and substrate lattice is greater the average grain size tends to decrease. The Cu 2 O films deposited on Ti-Kapton, Ni-Kapton and Pt-Kapton substrates exhibited maximum specific capacitances of 255, 273 and 350 F g −1 correspondingly at a constant current density of 1 A g −1 . The observed maximum specific capacitance for Cu x O thin films deposited on Pt-Kapton substrates is due to the lower lattice mismatch, high work function of the metal, availability of (111) planes and highly available active area.
ISSN:0973-1458
0974-9845
DOI:10.1007/s12648-017-1072-5