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Effects of H2O2 treatment on the temperature-dependent behavior of carrier transport and the optoelectronic properties for sol–gel grown MoS2/Si nanowire/Si devices
The effects of H 2 O 2 treatment on the temperature-dependent behavior of carrier transport and the optoelectronic properties of a MoS 2 /Si nanowire (SiNW)/n-Si device are studied. The MoS 2 thin films are prepared using the sol–gel method. The thermionic emission–diffusion model is the dominant pr...
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Published in: | Journal of materials science. Materials in electronics 2018-04, Vol.29 (7), p.6032-6039 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | The effects of H
2
O
2
treatment on the temperature-dependent behavior of carrier transport and the optoelectronic properties of a MoS
2
/Si nanowire (SiNW)/n-Si device are studied. The MoS
2
thin films are prepared using the sol–gel method. The thermionic emission–diffusion model is the dominant process in the MoS
2
/SiNW/n-Si device when there is no H
2
O
2
treatment. However, carrier transport in MoS
2
/SiNW/n-Si devices that are subject to H
2
O
2
treatment is dominated by thermionic emission, so it demonstrates reliable rectification. Passivation of the SiNW surface increases the responsivity to solar irradiation. There is a low trap density at the MoS
2
/SiNW interfaces so the increase in photocurrent density for the MoS
2
/SiNW/n-Si device that is subject to H
2
O
2
treatment is due to greater internal power conversion efficiency. The photo-response results for MoS
2
/SiNW/n-Si devices that are subject to (are not subject to) H
2
O
2
treatment confirm that the decay in the photocurrent is due to the dominance of long-lifetime (short-lifetime) charge trapping. MoS
2
/SiNW/n-Si devices that are subject to H
2
O
2
treatment exhibit reliable responsivity to solar irradiation. |
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ISSN: | 0957-4522 1573-482X |
DOI: | 10.1007/s10854-018-8577-3 |