Development of Self‐Heated Stage Suitable for Thermal Assist Reactive Ion Etching of the Functional Metals

SUMMARY This paper describes development of self‐heated stage suitable for thermal reactive ion etching (TRIE) of the functional metals. TRIE was evaluated using both experiments and simulations for etching functional metals. The self‐heated stage was designed based on the simulation results. TRIE e...

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Bibliographic Details
Published in:Electronics and communications in Japan 2018-03, Vol.101 (3), p.96-102
Main Authors: MURATA, YUKI, HAN, GANG, OHKAWA, DAIKI, IMAI, JUNICHI, SOHGAWA, MASAYUKI, ABE, TAKASHI
Format: Article
Language:English
Subjects:
Aluminum
deep reactive ion etching
Etching
fluoride gas
functional metals
hard‐to‐etch material
Ion etching
Molybdenum
Niobium
Reactive ion etching
Tantalum base alloys
Titanium base alloys
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Summary:SUMMARY This paper describes development of self‐heated stage suitable for thermal reactive ion etching (TRIE) of the functional metals. TRIE was evaluated using both experiments and simulations for etching functional metals. The self‐heated stage was designed based on the simulation results. TRIE employs a self‐heated stage which is thermally insulated aluminum plate as the etching stage of a regular RIE apparatus. The stage temperature increases rapidly within 10 min and etch rate does not depend on process time. TRIE technique was used to etch various kinds of functional metals: Ti, Mo, Ta, Nb, and Ti alloy (Ti‐6Al‐4V). It did improve the etching rate of these materials greatly.
ISSN:1942-9533
1942-9541
DOI:10.1002/ecj.12046