Photosensitive anti-biofouling polycarboxymethylbetaine coating: Polymerization, photolithography, and cell aggregation along the pattern geometry

Polycaboxymethylbetaine (PCMB) having a carboxymethylbetaine (CMB) and epoxy structure on its side chains was synthesized. The photosensitive anti-biofouling coating was formulated by loading the PCMB with a photo acid generator (PAG). By applying i-line irradiation and subsequent baking to this coa...

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Bibliographic Details
Published in:Microelectronic engineering 2018-04, Vol.189, p.11-17
Main Authors: Sugita, Hikaru, Uchida, Tarou, Kato, Shoichi, Suda, Kiyoshi, Miyaji, Masaaki
Format: Article
Language:English
Subjects:
Baking
Biocompatibility
Biofouling
Biological applications of polymers
Biomaterials coatings
Coating
Colon
Colorectal cancer
Copolymerization
Geometry
Photolithography
Photosensitivity
Polymerization
Stem cells
Studies
Substrates
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Summary:Polycaboxymethylbetaine (PCMB) having a carboxymethylbetaine (CMB) and epoxy structure on its side chains was synthesized. The photosensitive anti-biofouling coating was formulated by loading the PCMB with a photo acid generator (PAG). By applying i-line irradiation and subsequent baking to this coating film, the processed area of the former film became insoluble to water, and thus, photolithographic polymer micropatterns with various dimensions were created on the substrates. As an initial assessment for targeted three-dimensional (3D) culture, HT-29 human colon cancer cells and UE7T-13 human mesenchymal stem cells (hMSCs) were disseminated on the patterns, and then cultured. Results showed that both cells selectively aggregated within the patterns. The cell aggregates prepared here may be promising candidates for use in regenerative medicine and/or drag screening. [Display omitted] •Water developable polymethacrylate having a carboxymethylbetaine structure was synthesized.•I-line photolithography of the film having the polymer gave micropatterns.•The cells seeded on the anti-biofouling film aggregated selectively along the pattern geometry.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2017.12.009