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A CVD Process for Producing Atomic Current Sources Based on 63Ni
A CVD process was developed for producing 63 Ni-based atomic batteries by deposition of active 63 Ni layers onto semiconductor silicon supports. Tetrakis(trifluorophosphine)nickel synthesized from 63 Ni metal and phosphorus trifluoride was used as the volatile precursor. The influence of the support...
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Published in: | Radiochemistry (New York, N.Y.) N.Y.), 2018, Vol.60 (2), p.158-163 |
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Main Authors: | , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | A CVD process was developed for producing
63
Ni-based atomic batteries by deposition of active
63
Ni layers onto semiconductor silicon supports. Tetrakis(trifluorophosphine)nickel synthesized from
63
Ni metal and phosphorus trifluoride was used as the volatile precursor. The influence of the support temperature and working pressure on the characteristics of the
63
Ni coating was examined. |
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ISSN: | 1066-3622 1608-3288 |
DOI: | 10.1134/S1066362218020054 |