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Geometric Effects in Current-Voltage Characteristics of a Cross-Shaped MDM Ni/NiO/Fe Structure
The current–voltage ( I – U ) characteristics of a cross-shaped metal-dielectric-metal (MDM) Ni/NiO/Fe structures with NiO layers of different thicknesses are investigated. The dependence of the sign of the differential resistance on the current flowing through the structure and on the thickness of...
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Published in: | Russian microelectronics 2018-05, Vol.47 (3), p.181-186 |
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container_title | Russian microelectronics |
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creator | Malikov, I. V. Berezin, V. A. Fomin, L. A. Mikhailov, G. M. |
description | The current–voltage (
I
–
U
) characteristics of a cross-shaped metal-dielectric-metal (MDM) Ni/NiO/Fe structures with NiO layers of different thicknesses are investigated. The dependence of the sign of the differential resistance on the current flowing through the structure and on the thickness of the NiO in a four-contact measuring system of potentials is revealed. In a region 8–10 nm thick, the voltage on the structure changes sign thrice and has the form of an N-shaped curve. This dependence is explained by the geometric effect, which appears due to the competition between the vertical and lateral electron transport, when the ratio of the resistances of the dielectric interlayer and metallic leading electrodes changes under the influence of the current. The numerical calculation confirms the experimentally observed
I
–
U
dependences. |
doi_str_mv | 10.1134/S1063739718030095 |
format | article |
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I
–
U
) characteristics of a cross-shaped metal-dielectric-metal (MDM) Ni/NiO/Fe structures with NiO layers of different thicknesses are investigated. The dependence of the sign of the differential resistance on the current flowing through the structure and on the thickness of the NiO in a four-contact measuring system of potentials is revealed. In a region 8–10 nm thick, the voltage on the structure changes sign thrice and has the form of an N-shaped curve. This dependence is explained by the geometric effect, which appears due to the competition between the vertical and lateral electron transport, when the ratio of the resistances of the dielectric interlayer and metallic leading electrodes changes under the influence of the current. The numerical calculation confirms the experimentally observed
I
–
U
dependences.</description><identifier>ISSN: 1063-7397</identifier><identifier>EISSN: 1608-3415</identifier><identifier>DOI: 10.1134/S1063739718030095</identifier><language>eng</language><publisher>Moscow: Pleiades Publishing</publisher><subject>Contact potentials ; Current voltage characteristics ; Electrical Engineering ; Electron transport ; Engineering ; Flow resistance ; Interlayers ; Iron ; Nickel oxides</subject><ispartof>Russian microelectronics, 2018-05, Vol.47 (3), p.181-186</ispartof><rights>Pleiades Publishing, Ltd. 2018</rights><rights>Copyright Springer Science & Business Media 2018</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c2315-14a193a58610e611cd7a150e98dc4488df30e947bee4a7f25ba5d51e466f35223</citedby><cites>FETCH-LOGICAL-c2315-14a193a58610e611cd7a150e98dc4488df30e947bee4a7f25ba5d51e466f35223</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Malikov, I. V.</creatorcontrib><creatorcontrib>Berezin, V. A.</creatorcontrib><creatorcontrib>Fomin, L. A.</creatorcontrib><creatorcontrib>Mikhailov, G. M.</creatorcontrib><title>Geometric Effects in Current-Voltage Characteristics of a Cross-Shaped MDM Ni/NiO/Fe Structure</title><title>Russian microelectronics</title><addtitle>Russ Microelectron</addtitle><description>The current–voltage (
I
–
U
) characteristics of a cross-shaped metal-dielectric-metal (MDM) Ni/NiO/Fe structures with NiO layers of different thicknesses are investigated. The dependence of the sign of the differential resistance on the current flowing through the structure and on the thickness of the NiO in a four-contact measuring system of potentials is revealed. In a region 8–10 nm thick, the voltage on the structure changes sign thrice and has the form of an N-shaped curve. This dependence is explained by the geometric effect, which appears due to the competition between the vertical and lateral electron transport, when the ratio of the resistances of the dielectric interlayer and metallic leading electrodes changes under the influence of the current. The numerical calculation confirms the experimentally observed
I
–
U
dependences.</description><subject>Contact potentials</subject><subject>Current voltage characteristics</subject><subject>Electrical Engineering</subject><subject>Electron transport</subject><subject>Engineering</subject><subject>Flow resistance</subject><subject>Interlayers</subject><subject>Iron</subject><subject>Nickel oxides</subject><issn>1063-7397</issn><issn>1608-3415</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNp1UE1PwkAQ3RhNRPQHeNvEc2Vnv9oeTQU0QTigHm2W7SyUQIu724P_3hJMPBhPbybvYyaPkFtg9wBCjpbAtEhFnkLGBGO5OiMD0CxLhAR13s89nRz5S3IVwpYxYEzrAfmYYrvH6GtLx86hjYHWDS0677GJyXu7i2aNtNgYb2xEX4dY20BbRw0tfBtCstyYA1b05fGFzuvRvF6MJkiX0Xc2dh6vyYUzu4A3Pzgkb5Pxa_GUzBbT5-JhllguQCUgDeTCqEwDQw1gq9SAYphnlZUyyyon-kWmK0RpUsfVyqhKAUqtnVCciyG5O-UefPvZYYjltu18058sOROKcaF7HBI4qezxdY-uPPh6b_xXCaw81lj-qbH38JMn9Npmjf43-X_TNwb3cho</recordid><startdate>20180501</startdate><enddate>20180501</enddate><creator>Malikov, I. V.</creator><creator>Berezin, V. A.</creator><creator>Fomin, L. A.</creator><creator>Mikhailov, G. M.</creator><general>Pleiades Publishing</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20180501</creationdate><title>Geometric Effects in Current-Voltage Characteristics of a Cross-Shaped MDM Ni/NiO/Fe Structure</title><author>Malikov, I. V. ; Berezin, V. A. ; Fomin, L. A. ; Mikhailov, G. M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2315-14a193a58610e611cd7a150e98dc4488df30e947bee4a7f25ba5d51e466f35223</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>Contact potentials</topic><topic>Current voltage characteristics</topic><topic>Electrical Engineering</topic><topic>Electron transport</topic><topic>Engineering</topic><topic>Flow resistance</topic><topic>Interlayers</topic><topic>Iron</topic><topic>Nickel oxides</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Malikov, I. V.</creatorcontrib><creatorcontrib>Berezin, V. A.</creatorcontrib><creatorcontrib>Fomin, L. A.</creatorcontrib><creatorcontrib>Mikhailov, G. M.</creatorcontrib><collection>CrossRef</collection><jtitle>Russian microelectronics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Malikov, I. V.</au><au>Berezin, V. A.</au><au>Fomin, L. A.</au><au>Mikhailov, G. M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Geometric Effects in Current-Voltage Characteristics of a Cross-Shaped MDM Ni/NiO/Fe Structure</atitle><jtitle>Russian microelectronics</jtitle><stitle>Russ Microelectron</stitle><date>2018-05-01</date><risdate>2018</risdate><volume>47</volume><issue>3</issue><spage>181</spage><epage>186</epage><pages>181-186</pages><issn>1063-7397</issn><eissn>1608-3415</eissn><abstract>The current–voltage (
I
–
U
) characteristics of a cross-shaped metal-dielectric-metal (MDM) Ni/NiO/Fe structures with NiO layers of different thicknesses are investigated. The dependence of the sign of the differential resistance on the current flowing through the structure and on the thickness of the NiO in a four-contact measuring system of potentials is revealed. In a region 8–10 nm thick, the voltage on the structure changes sign thrice and has the form of an N-shaped curve. This dependence is explained by the geometric effect, which appears due to the competition between the vertical and lateral electron transport, when the ratio of the resistances of the dielectric interlayer and metallic leading electrodes changes under the influence of the current. The numerical calculation confirms the experimentally observed
I
–
U
dependences.</abstract><cop>Moscow</cop><pub>Pleiades Publishing</pub><doi>10.1134/S1063739718030095</doi><tpages>6</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1063-7397 |
ispartof | Russian microelectronics, 2018-05, Vol.47 (3), p.181-186 |
issn | 1063-7397 1608-3415 |
language | eng |
recordid | cdi_proquest_journals_2035023620 |
source | Springer Nature |
subjects | Contact potentials Current voltage characteristics Electrical Engineering Electron transport Engineering Flow resistance Interlayers Iron Nickel oxides |
title | Geometric Effects in Current-Voltage Characteristics of a Cross-Shaped MDM Ni/NiO/Fe Structure |
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