Nanoparticle production from HMDSO in atmospheric pressure argon‐oxygen plasma

A dielectric barrier discharge containing argon and oxygen is used to dissociate HMDSO with the purpose of producing silica‐like particles. Solid material is deposited in an electrostatic precipitator and analyzed with SEM, FTIR, and weight measurements. The variation of oxygen concentration shows a...

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Bibliographic Details
Published in:Plasma processes and polymers 2018-05, Vol.15 (5), p.n/a
Main Authors: Wallimann, Roger, Roth, Christian, Rudolf von Rohr, Philipp
Format: Article
Language:English
Subjects:
Argon
atmospheric pressure filamentary discharge (APFD)
ATR‐FTIR
Dielectric barrier discharge
Electrostatic precipitators
HMDSO
Nanoparticles
nanostructures
Oxygen plasma
Plasma
Precipitators
SEM
Silicon dioxide
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Summary:A dielectric barrier discharge containing argon and oxygen is used to dissociate HMDSO with the purpose of producing silica‐like particles. Solid material is deposited in an electrostatic precipitator and analyzed with SEM, FTIR, and weight measurements. The variation of oxygen concentration shows an optimum for particle yield at an oxygen‐to‐monomer ratio of 20. Increasing yield and nanoparticle formation are also found with increasing excitation frequency and explained with the corresponding higher power input and nanoparticle survival rates from aerosol theory. Nanoparticles only form when residence time allows decomposition, nucleation, and growth. Silica‐like nanoparticles can be admixed to fine powders to enhance flow properties. Currently, the admixture is a batch process with long mixing times. An atmospheric dielectric barrier discharge could be a viable alternative for the production of nanoparticles and subsequent continuous mixing with powders. As a first step, HMDSO is studied for its possible application.
ISSN:1612-8850
1612-8869
DOI:10.1002/ppap.201700202